Nishi Kenji | VLSI Research and Development Center, OKI Electric Industry Company, Ltd.
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概要
- NISHI Kenjiの詳細を見る
- 同名の論文著者
- VLSI Research and Development Center, OKI Electric Industry Company, Ltd.の論文著者
関連著者
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Nishi Kenji
VLSI Research and Development Center, OKI Electric Industry Company, Ltd.
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Nishi Kenji
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Fukuda K
Oki Electric Industry Co. Ltd.
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Ida Jiro
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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OHTOMO Atsushi
VLSI Research and Development Center, OKI Electric Industry Co., Ltd.
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Ohtomo A
Oki Electric Ind. Co. Ltd. Tokyo Jpn
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Ohtomo Atsushi
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Kita Akio
Vlsi Research & Development Center Oki Electric Industry Co. Ltd.
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Kita Akio
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Fukuda Koichi
VLSI Research and Development Center, OKI Electric Industry Company, Ltd.
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YONEKAWA Kiyotaka
VLSI Research and Development Center, OKI Electric Industry Co., Ltd.
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KAI Kazuhiko
VLSI Research and Development Center, OKI Electric Industry Co., Ltd.
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AIKAWA Izumi
VLSI Research and Development Center, OKI Electric Industry Co., Ltd.
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Kai Kazuhiko
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Aikawa Izumi
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Yonekawa Kiyotaka
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Nishi Kenji
Vlsi Research And Development Center Oki Electric Industry Company Ltd.
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NISHI Kenji
VLSI Research and Development Center, OKI Electric Industry Co., Ltd.
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FUKUDA Koichi
VLSI R & D Center, Oki Electric Industry Co., Ltd.,
著作論文
- A New Wide Applicable Mobility Model for Device Simulation Taking Physics-Based Carrier Screening Effects into Account
- Dopant Redistribution Effect on Post-Junction Silicide Scheme Shallow Junction and a Proposal of Novel Self-Aligned Silicide Scheme