A New Wide Applicable Mobility Model for Device Simulation Taking Physics-Based Carrier Screening Effects into Account
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概要
- 論文の詳細を見る
Carrier mobility is one of the most fundamental parameters in semiconductor device modeling, and many mobility models have already been reported. Especially for numerical device simulators, many local models which are functions of impurity concentration and electric field at each local point have been studied. However, concerning their dependence on impurity concentration including carrier screening effects, these models suffer parameter fitting procedure because of their empirical formulation. In such models, carrier screening effects to the Coulomb potential of ionized impurity are not sufficiently considered, although we can find some models which treat the effects as only a small perturbation term. According to the simple theory of Brooks and Herring, carrier screening effects should be included in strong combination with impurity concentration terms and cannot be treated as additional perturbations. Although Brooks-Herring theory is successful, it also suffers from overestimation of the mobility values at concentration higher than 10^lt18gtcm^lt-3gt which causes some other complicated phenomena. Therefore there have been no models which directly use Brooks-Herring formula. But it is true that such screening effects should be considered when carrier concentration differs from impurity concentration as in the inversion layers of MOSFETs. We have developed a new mobility model for its dependence of impurity and carrier concentration based on the theory of Brooks-Herring. Brooks-Herring theory is based on simple physics of screened Coulomb potential, and therefore makes the model to include effects of free carriers without an artifitial formula. For high doping regime, an additional term has been introduced in Brooks-Herring formula to correct the high doping effects. Except for this term, the model should be most appropriate for including the carrier screening effects upto the concentration of 10^lt18gtcm^lt-3gt. The new model is implimented in a device simulator, and is applied to the evaluation of MOSFETs especially for the universal curves of inversion layer mobility. Moreover, the applications to the depletion-type MOSFET confirm the validity of the screening effects. The purpose of this paper is to propose the new mobility model and to show its validity through these applications to MOSFETs.
- 社団法人電子情報通信学会の論文
- 1995-03-25
著者
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Fukuda K
Oki Electric Industry Co. Ltd.
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Fukuda Koichi
VLSI Research and Development Center, OKI Electric Industry Company, Ltd.
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Nishi Kenji
VLSI Research and Development Center, OKI Electric Industry Company, Ltd.
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Nishi Kenji
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Nishi Kenji
Vlsi Research And Development Center Oki Electric Industry Company Ltd.
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FUKUDA Koichi
VLSI R & D Center, Oki Electric Industry Co., Ltd.,
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