FUKUDA Koichi | VLSI R & D Center, Oki Electric Industry Co., Ltd.,
スポンサーリンク
概要
関連著者
-
Fukuda Koichi
VLSI Research and Development Center, OKI Electric Industry Company, Ltd.
-
FUKUDA Koichi
VLSI R & D Center, Oki Electric Industry Co., Ltd.,
-
Fukuda K
Oki Electric Industry Co. Ltd.
-
Nishi Kenji
VLSI Research and Development Center, OKI Electric Industry Company, Ltd.
-
Nishi Kenji
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
-
Nishi Kenji
Vlsi Research And Development Center Oki Electric Industry Company Ltd.
-
THOMA Rainer
Institut fur Theoretische Elektrotechnik, University of Aachen
-
PEIFER Hermann-Josef
Institut fur Theoretische Elektrotechnik, University of Aachen
-
MEINERZHAGEN Bernd
Institut fur Theoretische Elektrotechnik, University of Aachen
-
ENGL Walter
Institut fur Theoretische Elektrotechnik, University of Aachen
著作論文
- A New Wide Applicable Mobility Model for Device Simulation Taking Physics-Based Carrier Screening Effects into Account
- New Efficient Treatment of Impact Ionization in Submicron Metal-Oxide-Semiconductor Field-Effect Transistors