A Study of Via-Electromigration Failure in Multilevel Interconnection with High Temperature Sputtered Aluminum

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概要

• 論文の詳細を見る
• 1996-08-26

著者

• Onoda Hiroshi

  Vlsi Research And Development Center Oki Electric Industry Co. Ltd.

• Kageyama Makiko

  Vlsi R&d Center Oki Electric Industry Co. Ltd.

• Hashimoto Keiichi

  Vlsi R&d Center Oki Electric Industry Co. Ltd.

• Onoda Hiroshi

  Vlsi R&d Center Oki Electric Industry Co. Ltd.

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• A Study of Via-Electromigration Failure in Multilevel Interconnection with High Temperature Sputtered Aluminum

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