Role of Fluorine in Reactive Ion Etching of Silicon Dioxide
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-12-30
著者
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IKEGAMI Naokatsu
VLSI R〓D Center, Oki Electric Industry Co., Ltd.
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Hashimoto J
Nagasaki Univ. Nagasaki Jpn
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KANAMORI Jun
VLSI R&D Center, Oki Electric Industry Co., Ltd.
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Kanamori J
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Kanamori Jun
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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OZAWA Nobuo
VLSI R&D Center, Oki Electric Industry Co., Ltd.
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Ozawa N
Oki Electric Ind. Co. Ltd. Tokyo Jpn
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Ozawa Nobuo
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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MIYAKAWA Yasuhiro
VLSI R&D Center, Electronic Devices Group, Oki Electric Industry Co., Ltd.
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HASHIMOTO Jun
VLSI R&D Center, Electronic Devices Group, Oki Electric Industry Co., Ltd.
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Miyakawa Yasuhiro
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Ikegami Naokatsu
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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HASHIMOTO Jun
VLSI R&D Center, Oki Electric Industry Co., Ltd.
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