Ozawa N | Oki Electric Ind. Co. Ltd. Tokyo Jpn

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概要

• OZAWA Nobuoの詳細を見る
• 同名の論文著者
• Oki Electric Ind. Co. Ltd. Tokyo Jpnの論文著者

関連著者

• IKEGAMI Naokatsu

  VLSI R〓D Center, Oki Electric Industry Co., Ltd.

• KANAMORI Jun

  VLSI R&D Center, Oki Electric Industry Co., Ltd.

• Kanamori J

  Vlsi Research And Development Center Oki Electric Industry Co. Ltd.

• Kanamori Jun

  Vlsi R&d Center Oki Electric Industry Co. Ltd.

• OZAWA Nobuo

  VLSI R&D Center, Oki Electric Industry Co., Ltd.

• Ozawa N

  Oki Electric Ind. Co. Ltd. Tokyo Jpn

• Ozawa Nobuo

  Vlsi R&d Center Oki Electric Industry Co. Ltd.

• MIYAKAWA Yasuhiro

  VLSI R&D Center, Electronic Devices Group, Oki Electric Industry Co., Ltd.

• Miyakawa Yasuhiro

  Vlsi Research And Development Center Oki Electric Industry Co. Ltd.

• Ikegami Naokatsu

  Vlsi R&d Center Oki Electric Industry Co. Ltd.

• KONISHI Mamoru

  VLSI R & D Center, Electronic Devices, OKI Electric Industry Co., Ltd

• Konishi M

  Basic Process Technology Department Advanced Devices Department Usli R&d Labs. Semiconductor Co.

• Hirashita N

  Oki Electric Industry Co. Ltd. Vlsi R&d Center

• Hirashita Norio

  Vlsi Research And Development Center Oki Electric Industry Co. Ltd.

• Hirashita Norio

  Vlsi R&d Center Oki Electric Industry Co. Ltd.

• Hashimoto J

  Nagasaki Univ. Nagasaki Jpn

• HASHIMOTO Jun

  VLSI R&D Center, Electronic Devices Group, Oki Electric Industry Co., Ltd.

• HASHIMOTO Jun

  VLSI R&D Center, Oki Electric Industry Co., Ltd.

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著作論文

• Role of Fluorine in Reactive Ion Etching of Silicon Dioxide
• Mechanisms of Surface Reaction in Fluorocarbon Dry Etching of Silicon Dioxide : An Effect of Thermal Excitation
• Mechanisms of High PSG/SiO_2 Selective Etching in a Highly Polymerized Fluorocarbon Plasma
• Roles of Ions and Radicals in Silicon Oxide Etching : Etching and Deposition Technology
• Roles of Ions and Radicals in Silicon Oxide Etching

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