Hirashita Norio | Vlsi R&d Center Oki Electric Industry Co. Ltd.
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概要
関連著者
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Hirashita Norio
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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Hirashita Norio
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Hirashita N
Oki Electric Industry Co. Ltd. Vlsi R&d Center
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UCHIDA Hidetsugu
VLSI R&D Center, Oki Electric Industry Co., Ltd.
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Fujita Ken
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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UCHIDA Hidetsugu
VLSI R&D Center, Oki Electric Industry Co., Ltd.
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Fujita K
Oki Electric Industry Co. Ltd. Tokyo
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Fujita K
Department Of Material Chemistry Graduate School Of Engineering Kyoto University
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Fujita K
Univ. Tokyo Tokyo Jpn
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KANAMORI Jun
VLSI R&D Center, Oki Electric Industry Co., Ltd.
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Kanamori J
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Kanamori Jun
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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MIYAKAWA Yasuhiro
VLSI R&D Center, Electronic Devices Group, Oki Electric Industry Co., Ltd.
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FUJITA Ken
VLSI Research and Development Center, Oki Electric Industry Co., Ltd.
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Miyakawa Yasuhiro
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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IKEGAMI Naokatsu
VLSI R〓D Center, Oki Electric Industry Co., Ltd.
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Sinclair Robert
Department of Materials Science and Engineering, Stanford University
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OKIHARA Masao
VLSI R&D Center, Oki Electric Industry Co., Ltd.
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Okihara Masao
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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Sinclair R
Department Of Marerials Science And Engineering Stanford University
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Sinclair Robert
Department Of Materials Science And Engineering Stanford University
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TANAKA Hiroyuki
VLSI R&D Center, Oki Electric Industry Co., Ltd.
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Tokitoh Shunichi
VLSI Research and Development Center, Oki Electric Industry Co., Ltd.
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Tokitoh Shunichi
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Ikegami Naokatsu
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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Tanaka Hiroyuki
Department of Electrical Engineering, Faculty of engineering Science, Osaka University
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Sinclair Robert
Department of Marerials Science and Engineering, Stanford University
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Hirashita Norio
Vlsi Research Center Oki Electric Industry Co. Ltd.
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Liu Guo-lin
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Ikeda S
Tohoku Univ. Sendai‐shi Jpn
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IKEDA Satoshi
VLSI R&D Center, Oki Electric Industry Co., Ltd.
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Okihara M
Oki Electric Ind. Co. Ltd. Tokyo Jpn
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OZAWA Nobuo
VLSI R&D Center, Oki Electric Industry Co., Ltd.
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Kuroda Shigeki
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Ozawa N
Oki Electric Ind. Co. Ltd. Tokyo Jpn
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Ozawa Nobuo
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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Itoh Masahiro
VLSI Research and Development Center, Oki Electric Industry Co., Ltd.
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Yabata Atsushi
VLSI Research and Development Center, Oki Electric Industry Co., Ltd, 550-1 Higashiasakawa, Hachioji
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Liu Guo
VLSI Research and Development Center, Oki Electric Industry Co., Ltd, 550-1 Higashiasakawa, Hachioji
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Uchida Hiroaki
Process Technology Center, Oki Electric Industry Co., Ltd.
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Okuno Yasuyuki
Process Technology Center, Oki Electric Industry Co., Ltd.
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Fushimi Kimihisa
Process Technology Center, Oki Electric Industry Co., Ltd.
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Sakaya Yoshihiro
Process Technology Center, Oki Electric Industry Co., Ltd.
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Okuno Yasuyuki
Process Technology Center Oki Electric Industry Co. Ltd.
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Yabata Atsushi
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Ichimori Takashi
Vlsi Research Center Oki Electric Industry Co. Ltd.
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Liu Guo
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Fushimi Kimihisa
Process Technology Center Oki Electric Industry Co. Ltd.
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Sakaya Yoshihiro
Process Technology Center Oki Electric Industry Co. Ltd.
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Itoh Masahiro
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Kuroda S
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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IKEDA Satoshi
VLSI R&D Center, Oki Electric Industry Co., Ltd.
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Hirashita Norio
VLSI R&D Center, Oki Electric Industry Co., Ltd.
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OKIHARA Masao
VLSI R&D Center, Oki Electric Industry Co., Ltd.
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Yabata Atsushi
VLSI R&D Center, Electronic Devices Group, Oki Electric Industry Co., Ltd
著作論文
- Cross-sectional Transmission Electron Microscope Studies on Intrinsic Breakdown Spots of Thin Gate Oxides
- Mechanisms of Surface Reaction in Fluorocarbon Dry Etching of Silicon Dioxide : An Effect of Thermal Excitation
- Step Edge Structures on Si(112) and (113) Surfaces Treated in NH_4F Solution
- Effect of Stress on Oxide Edge Shape of Local Oxidation of Silicon for Various Oxidation Temperatures
- Kinetic Analysis of the C49-to-C54 Phase Transformation in TiSi_2 Thin Films by In Situ Observation
- In Situ Observation of the C49-to-C54 Phase Transformation in TiSi_2 Thin Films by Transmission Electron Microscopy
- Vertical Profile Control in Ultrahigh-Aspect-Ratio Contact Hole Etching with 0.05-µm-Diameter Range
- Reaction Studies between Fluorocarbon Films and Si Using Temperature-Programmed X-Ray Photoelectron and Desorption Spectroscopies
- Studies of Corrosive Outgasses from Via Holes Using Thermal Desorption Spectroscopy
- X-Ray Photoelectron Spectroscopic Studies on Pyrolysis of Plasma-Polymerized Fluorocarbon Films on Si
- Thermal Desorption and Infrared Studies of Plasma-Enhanced Chemical Vapor Deposited SiO Films with Tetraethyiorthosilicate
- Structural Study of Single {111}-Facetted CoSi_2/Si Interface Incorporated in a Silicon-on-Insulator Metal-Oxide-Semiconductor-Field-Effect-Transistor(Semiconductors)
- Corrugated Structures on Si(110) Surfaces Treated in Ammonium Fluoride Solutions
- Desorption Kinetics of Ar Implanted into Si