Sinclair R | Department Of Marerials Science And Engineering Stanford University
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概要
関連著者
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Sinclair R
Department Of Marerials Science And Engineering Stanford University
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Sinclair Robert
Department of Materials Science and Engineering, Stanford University
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Sinclair Robert
Department Of Materials Science And Engineering Stanford University
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Sinclair Robert
Department of Marerials Science and Engineering, Stanford University
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今野 豊彦
阪府大院工
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今野 豊彦
東北大学金属材料研究所
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田中 宏幸
沖電気工業(株) 超lsi研究開発センタ
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平下 紀夫
沖電気工業(株)超LSI研究開発センタ
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Niwa M
Matsushita Electronics Corp. Kyoto Jpn
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Hirashita N
Oki Electric Industry Co. Ltd. Vlsi R&d Center
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平下 紀夫
沖電気工業株式会社超lsi研究セソタ
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Hirashita Norio
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Hirashita Norio
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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MATSUMOTO Mitsuhiro
Nara Prefectural Institute of Public Health
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沖原 将生
沖電気工業(株)超LSI研究開発センタ
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Matsumoto Michio
Faculty Of Engineering Yamanashi University
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Matsumoto M
National Inst. Materials And Chemical Res. Tsukuba Jpn
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Niwa M
Ulsi Process Technology Development Center Matsushita Electronics Corp.
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Niwa M
Department Of Materials Science And Engineering Tokyo Denki University
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NIWA Masaaki
Matsushita Electric Industrial Co., Ltd., Semiconductor Research Center
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ONODA Minoru
Matsushita Technoresearch, Inc., Materials Characterization Division
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MATSUMOTO Michikazu
Matsushita Electric Industrial Co., Ltd., Semiconductor Research Center
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IWASAKI Hiroshi
Matsushita Electric Industrial Co., Ltd., Semiconductor Research Center
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SINCLAIR Robert
Stanford University, Dept.of Materials Sicence and Engineering Stanford
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Matsumoto M
Nara Prefectural Institute Of Public Health
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TANAKA Hiroyuki
VLSI R&D Center, Oki Electric Industry Co., Ltd.
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Tanaka Hiroyuki
Department of Electrical Engineering, Faculty of engineering Science, Osaka University
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平下 紀夫
沖電気工業 (株) 超LSI開発センタ
著作論文
- In-situ TEMによるZr/Si界面反応の観察
- In-situ TEMによるZr/Si界面反応の観察
- SiO_2/Si Interfaces Studied by STM and HRTEM(II) : Etching and Deposition Technology
- SiO_2/Si Interfaces Studied by STM and HRTEM (II)
- Kinetic Analysis of the C49-to-C54 Phase Transformation in TiSi_2 Thin Films by In Situ Observation
- In Situ Observation of the C49-to-C54 Phase Transformation in TiSi_2 Thin Films by Transmission Electron Microscopy