Kinetic Analysis of the C49-to-C54 Phase Transformation in TiSi_2 Thin Films by In Situ Observation

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1998-08-15

著者

• Hirashita N

  Oki Electric Industry Co. Ltd. Vlsi R&d Center

• Hirashita Norio

  Vlsi Research And Development Center Oki Electric Industry Co. Ltd.

• Hirashita Norio

  Vlsi R&d Center Oki Electric Industry Co. Ltd.

• Sinclair Robert

  Department of Materials Science and Engineering, Stanford University

• Sinclair R

  Department Of Marerials Science And Engineering Stanford University

• Sinclair Robert

  Department Of Materials Science And Engineering Stanford University

• TANAKA Hiroyuki

  VLSI R&D Center, Oki Electric Industry Co., Ltd.

• Tanaka Hiroyuki

  Department of Electrical Engineering, Faculty of engineering Science, Osaka University

• Sinclair Robert

  Department of Marerials Science and Engineering, Stanford University

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