Kinetic Analysis of the C49-to-C54 Phase Transformation in TiSi_2 Thin Films by In Situ Observation
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1998-08-15
著者
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Hirashita N
Oki Electric Industry Co. Ltd. Vlsi R&d Center
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Hirashita Norio
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Hirashita Norio
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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Sinclair Robert
Department of Materials Science and Engineering, Stanford University
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Sinclair R
Department Of Marerials Science And Engineering Stanford University
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Sinclair Robert
Department Of Materials Science And Engineering Stanford University
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TANAKA Hiroyuki
VLSI R&D Center, Oki Electric Industry Co., Ltd.
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Tanaka Hiroyuki
Department of Electrical Engineering, Faculty of engineering Science, Osaka University
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Sinclair Robert
Department of Marerials Science and Engineering, Stanford University
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