X-Ray Photoelectron Spectroscopic Studies on Pyrolysis of Plasma-Polymerized Fluorocarbon Films on Si
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概要
- 論文の詳細を見る
Temperature-programmed X-ray photoelectron spectroscopy was used to study pyrolysis of fluorocarbon thin films polymerized on Si substrates in magnetomicrowave plasma with C_4F_8 gas. Variations of fluorocarbon moieties were obtained at the temperature range between 20 and 700℃. The films, consisting of CF_3, CF_2, CF and C-CF_x bonds, were found to be stable up to approximately 200℃ and to be pyrolyzed via the dissociation of the terminal bonds above this temperature.
- 社団法人応用物理学会の論文
- 1995-01-15
著者
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Fujita K
Oki Electric Industry Co. Ltd. Tokyo
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Fujita K
Department Of Material Chemistry Graduate School Of Engineering Kyoto University
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Hirashita N
Oki Electric Industry Co. Ltd. Vlsi R&d Center
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Hirashita Norio
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Hirashita Norio
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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Fujita K
Univ. Tokyo Tokyo Jpn
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MIYAKAWA Yasuhiro
VLSI R&D Center, Electronic Devices Group, Oki Electric Industry Co., Ltd.
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FUJITA Ken
VLSI Research and Development Center, Oki Electric Industry Co., Ltd.
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Miyakawa Yasuhiro
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Fujita Ken
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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