Kanamori J | Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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概要
関連著者
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Kanamori J
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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KANAMORI Jun
VLSI R&D Center, Oki Electric Industry Co., Ltd.
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Kanamori Jun
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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IKEGAMI Naokatsu
VLSI R〓D Center, Oki Electric Industry Co., Ltd.
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Miyakawa Yasuhiro
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Ikegami Naokatsu
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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MIYAKAWA Yasuhiro
VLSI R&D Center, Electronic Devices Group, Oki Electric Industry Co., Ltd.
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Taino Mitsuhiko
Kek High Energy Accelerator Research Organization
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MATSUI Tetsuyuki
Department of Physical Science, Graduate School of Engineering Science, Osaka University
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Matsui Toshiaki
Communication Research Laboratory Ministry Of Posts And Telecommunications
著作論文
- Role of Fluorine in Reactive Ion Etching of Silicon Dioxide
- Mechanisms of Surface Reaction in Fluorocarbon Dry Etching of Silicon Dioxide : An Effect of Thermal Excitation
- Mechanisms of High PSG/SiO_2 Selective Etching in a Highly Polymerized Fluorocarbon Plasma
- Roles of Ions and Radicals in Silicon Oxide Etching : Etching and Deposition Technology
- Roles of Ions and Radicals in Silicon Oxide Etching
- Vertical Profile Control in Ultrahigh-Aspect-Ratio Contact Hole Etching with 0.05-µm-Diameter Range
- Reaction Studies between Fluorocarbon Films and Si Using Temperature-Programmed X-Ray Photoelectron and Desorption Spectroscopies
- Thermal Desorption Spectroscopy and X-Ray Photoelectron Spectroscopy Study of CF_x Layer Deposited on Si and Si0_2
- Characteristics of Very High-Aspect-Ratio Contact Hole Etching
- Dry-Etching Mechanism of Sputtered Pb(Zr_Ti_x)O_3 Film