Kanamori J | Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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概要
関連著者
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Kanamori J
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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KANAMORI Jun
VLSI R&D Center, Oki Electric Industry Co., Ltd.
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Kanamori Jun
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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IKEGAMI Naokatsu
VLSI R〓D Center, Oki Electric Industry Co., Ltd.
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Miyakawa Yasuhiro
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Ikegami Naokatsu
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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MIYAKAWA Yasuhiro
VLSI R&D Center, Electronic Devices Group, Oki Electric Industry Co., Ltd.
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Taino Mitsuhiko
Kek High Energy Accelerator Research Organization
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MATSUI Tetsuyuki
Department of Physical Science, Graduate School of Engineering Science, Osaka University
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Matsui Toshiaki
Communication Research Laboratory Ministry Of Posts And Telecommunications
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Matsui T
Department Of Systems Innovation Graduate School Of Engineering Science Osaka University
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OZAWA Nobuo
VLSI R&D Center, Oki Electric Industry Co., Ltd.
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Ozawa N
Oki Electric Ind. Co. Ltd. Tokyo Jpn
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Ozawa Nobuo
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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Takasaki Minoru
Kek High Energy Accelerator Research Organization
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Hirashita N
Oki Electric Industry Co. Ltd. Vlsi R&d Center
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Hirashita Norio
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Hirashita Norio
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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Hashimoto J
Nagasaki Univ. Nagasaki Jpn
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Matsui Takayuki
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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Fujita K
Oki Electric Industry Co. Ltd. Tokyo
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Fujita K
Department Of Material Chemistry Graduate School Of Engineering Kyoto University
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Fujita K
Univ. Tokyo Tokyo Jpn
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HASHIMOTO Jun
VLSI R&D Center, Electronic Devices Group, Oki Electric Industry Co., Ltd.
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KONISHI Mamoru
VLSI R & D Center, Electronic Devices, OKI Electric Industry Co., Ltd
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Konishi M
Basic Process Technology Department Advanced Devices Department Usli R&d Labs. Semiconductor Co.
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Yabata Atsushi
VLSI Research and Development Center, Oki Electric Industry Co., Ltd, 550-1 Higashiasakawa, Hachioji
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Yabata Atsushi
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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HASHIMOTO Jun
VLSI R&D Center, Oki Electric Industry Co., Ltd.
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Yabata Atsushi
VLSI R&D Center, Electronic Devices Group, Oki Electric Industry Co., Ltd
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HORIIKE Yasuhiro
Department of Electrical Engineering, Toyo University
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Horiike Yasuhiro
Department Of Materials Science The University Of Tokyo
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Horiike Yasuhiro
Department Of Electrical & Electronics Engineering Tokyo University
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Horiike Yasuhiro
Department Of Electrical Engineering Hiroshima University
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UCHIDA Hidetsugu
VLSI R&D Center, Oki Electric Industry Co., Ltd.
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Yamauchi Takahiro
V-lsi R&d Center Oki Electric Co. Ltd.
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FUJITA Ken
VLSI Research and Development Center, Oki Electric Industry Co., Ltd.
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Liu Guo
VLSI Research and Development Center, Oki Electric Industry Co., Ltd, 550-1 Higashiasakawa, Hachioji
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MIYAKAWA Yasuhiro
ULSI R & D Center, Oki Electric Industry Co., Ltd.,
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FUJITA Ken
ULSI R & D Center, Oki Electric Industry Co., Ltd.,
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HIRASHITA Norio
ULSI R & D Center, Oki Electric Industry Co., Ltd.,
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IKEGAMI Naokatsu
ULSI R & D Center, Oki Electric Industry Co., Ltd.,
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HASHIMOTO Jun
ULSI R & D Center, Oki Electric Industry Co., Ltd.,
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MATSUI Takayuki
ULSI R & D Center, Oki Electric Industry Co., Ltd.,
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KANAMORI Jun
ULSI R & D Center, Oki Electric Industry Co., Ltd.,
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Horiike Yasuhiro
Department Of Materials Engineering The University Of Tokyo
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Horiike Yasuhiro
Department Of Electrical And Electronics Engineering Toyo University:department Of Materials Science
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Horiike Yasuhiro
Toshiba Research And Development Center Integrated Circuit Laboratory
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Horiike Yasuhiro
Toyo University
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MATSUI Takayuki
V-LSI R&D Center, Oki Electric Co., Ltd.
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KANAMORI Jun
V-LSI R&D Center, Oki Electric Co., Ltd.
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MIYAKAWA Yasuhiro
V-LSI R&D Center, Oki Electric Co., Ltd.
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SHIMOYAMA Kouhei
V-LSI R&D Center, Oki Electric Co., Ltd.
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Liu Guo
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Shimoyama Kouhei
V-lsi R&d Center Oki Electric Co. Ltd.
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Fujita Ken
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Horiike Yasuhiro
Department Of Electrical & Electronics Engineering Toyo University
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UCHIDA Hidetsugu
VLSI R&D Center, Oki Electric Industry Co., Ltd.
著作論文
- Role of Fluorine in Reactive Ion Etching of Silicon Dioxide
- Mechanisms of Surface Reaction in Fluorocarbon Dry Etching of Silicon Dioxide : An Effect of Thermal Excitation
- Mechanisms of High PSG/SiO_2 Selective Etching in a Highly Polymerized Fluorocarbon Plasma
- Roles of Ions and Radicals in Silicon Oxide Etching : Etching and Deposition Technology
- Roles of Ions and Radicals in Silicon Oxide Etching
- Vertical Profile Control in Ultrahigh-Aspect-Ratio Contact Hole Etching with 0.05-µm-Diameter Range
- Reaction Studies between Fluorocarbon Films and Si Using Temperature-Programmed X-Ray Photoelectron and Desorption Spectroscopies
- Thermal Desorption Spectroscopy and X-Ray Photoelectron Spectroscopy Study of CF_x Layer Deposited on Si and Si0_2
- Characteristics of Very High-Aspect-Ratio Contact Hole Etching
- Dry-Etching Mechanism of Sputtered Pb(Zr_Ti_x)O_3 Film
- 0.2 μm Hole Pattern Generation by Critical Dimension Biassing Using Resin Overcoat
- Fine Contact Hole Etching in Magneto-Microwave Plasma