IKEGAMI Naokatsu | ULSI R & D Center, Oki Electric Industry Co., Ltd.,

スポンサーリンク

概要

• 同名の論文著者
• ULSI R & D Center, Oki Electric Industry Co., Ltd.,の論文著者

関連著者

• Fujita K

  Oki Electric Industry Co. Ltd. Tokyo

• Fujita K

  Department Of Material Chemistry Graduate School Of Engineering Kyoto University

• Taino Mitsuhiko

  Kek High Energy Accelerator Research Organization

• Hirashita N

  Oki Electric Industry Co. Ltd. Vlsi R&d Center

• MATSUI Tetsuyuki

  Department of Physical Science, Graduate School of Engineering Science, Osaka University

• Matsui Toshiaki

  Communication Research Laboratory Ministry Of Posts And Telecommunications

• Fujita K

  Univ. Tokyo Tokyo Jpn

• Matsui T

  Department Of Systems Innovation Graduate School Of Engineering Science Osaka University

• Hashimoto J

  Nagasaki Univ. Nagasaki Jpn

• Kanamori J

  Vlsi Research And Development Center Oki Electric Industry Co. Ltd.

• MIYAKAWA Yasuhiro

  ULSI R & D Center, Oki Electric Industry Co., Ltd.,

• FUJITA Ken

  ULSI R & D Center, Oki Electric Industry Co., Ltd.,

• HIRASHITA Norio

  ULSI R & D Center, Oki Electric Industry Co., Ltd.,

• IKEGAMI Naokatsu

  ULSI R & D Center, Oki Electric Industry Co., Ltd.,

• HASHIMOTO Jun

  ULSI R & D Center, Oki Electric Industry Co., Ltd.,

• MATSUI Takayuki

  ULSI R & D Center, Oki Electric Industry Co., Ltd.,

• KANAMORI Jun

  ULSI R & D Center, Oki Electric Industry Co., Ltd.,

• Takasaki Minoru

  Kek High Energy Accelerator Research Organization

• Miyakawa Yasuhiro

  Vlsi Research And Development Center Oki Electric Industry Co. Ltd.

もっと見る 閉じる

著作論文

• Thermal Desorption Spectroscopy and X-Ray Photoelectron Spectroscopy Study of CF_x Layer Deposited on Si and Si0_2

スポンサーリンク