Electron Beam Induced Damage of MOS Gate Oxide

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概要

• 論文の詳細を見る
• 1997-09-16

著者

• Koike K

  Nanomaterials Microdevices Research Center Osaka Institute Of Technology

• Kubota M

  Opto-electronics Laboratories Oki Electric Industry Co. Ltd.

• Konishi M

  Basic Process Technology Department Advanced Devices Department Usli R&d Labs. Semiconductor Co.

• KONISHI Morikazu

  Basic Process Technology Department, Advanced Devices Department, USLI R&D Labs., Semiconductor Co.,

• KOIKE Kaoru

  Basic Process Technology Department, Advanced Devices Department, USLI R&D Labs., Semiconductor Co.,

• KUBOTA Michitaka

  Advanced Devices Department, ULSI R&D Labs., Semiconductor Co., Sony Corp.

• Koike Kunihiko

  Shiga Technology Center Iwatani International Corp

• Koike Kazuto

  Nanomaterials Microdevices Research Center Osaka Institute Of Technology

• Konishi Morikazu

  Basic Process Technology Department, Advanced Devices Department, USLI R&D Labs., Semiconductor Co., Sony Corp.

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