Preparation and Dielectric and Electrooptic Properties of Bi_4Ti_3O_<12> Films by Electron Cyclotron Resonance plasma Sputtering Deposition : Thin Films

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1991-09-30

著者

• GOTO Takashi

  Institute for Materials Research, Tohoku University

• BABA Akira

  Center for Transdisciplinary Research, Niigata University

• Baba Akira

  Department Of Cardiovascular Medicine Wakayama Medical University

• Baba A

  Niigata Univ. Niigata Jpn

• Baba A

  Hachinohe Inst. Technol. Aomori

• MASUDA Yoichiro

  Department of Electrical Engineering, Faculty of Engineering, Hachinohe Institute of Technology

• MASUMOTO Hiroshi

  Institute for Materials Research, Tohoku University

• HIRAI Toshio

  Institute for Materials Research, Tohoku University

• MINAKATA Makoto

  Institute of Electrical Communication, Tohoku Universtiy

• Hirai T

  Tohoku Univ. Sendai‐shi

• Hirai Toshio

  Institute For Materals Research Tohoku University

• Goto Takashi

  Institute For Material Research Tohoku University

• Hirai Toshihiro

  Material Development Research Laboratory Nippon Mining Co. Lid.

• Masuda Yoshitake

  Nagoya University Graduate School Of Engineering Department Of Applied Chemistry

• Masuda Yoichiro

  Department Of Electrical And Electronics Engineering Graduate School Hachinohe Institute Of Technolo

• Baba A

  Center For Transdisciplinary Research Niigata University

• Baba A

  Kyushu Univ.

• Masumoto H

  Institute For Materials Research Tohoku University

• Masuda Y

  Human Ecology Research Center Sanyo Electric Co. Ltd.

• Masumoto Hiroshi

  Institute For Materials Research Tohoku University

• Goto T

  Tohoku Univ. Miyagi Jpn

• Minakata Makoto

  Institute Of Electrical Communication Tohoku Universtiy

• Masumoto Hiroshi

  Institut Fur Physiologische Chemie I Heinrich-heine-universitat Dusseldorf

• Masuda Yoichiro

  Department of Applied Chemistry, Graduate School of Engineering, Nagoya University

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