Behavior of Defects Induced by Low-Energy Ions in Silicon Films
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-12-30
著者
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Nakashima Hiroshi
Department Of Cardiology Nagasaki Citizens Hospital
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SADOH Taizoh
Department of Electronics, Kyushu University
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BABA Akira
Center for Transdisciplinary Research, Niigata University
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Baba A
Niigata Univ. Niigata Jpn
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Sadoh Taizoh
Department Of Electronics Faculty Of Engineering Kyushu University
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Baba A
Hachinohe Inst. Technol. Aomori
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TSURUSHIMA Toshio
Department of Electronic Device Engineering, Kyushu University
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BABA Akiyoshi
Department of Electrical Engineering,Faculty of Engineering,Kyushu University
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KENJO Atsushi
Department of Electrical Engineering,Faculty of Engineering,Kyushu University
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TAKESHITA Hironori
Department of Electrical Engineering, Kyushu University
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Nakashima H
Kyushu Univ.
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Baba A
Center For Transdisciplinary Research Niigata University
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Baba A
Kyushu Univ.
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Kenjo A
Kyushu Univ.
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KENJO Atsushi
Kyushu University, Department of Electronics
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Kenjo A
Kyushu University Department Of Electronics
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Tsurushima T
Kyushu Univ.
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Takeshita Hironori
Department Of Electrical Engineering Kyushu University
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Nakashima Hiroshi
Department Of Cancer Therapy And Research Graduate School Of Medical Sciences Kyushu University
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Nakashima Hiroshi
Department Of Biology Faculty Of Science Okayama University
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TSURUSHIMA Toshio
Department of Electrical Engineering, Kyushu University
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