Easy Release of Mold in Imprint Lithography Using Ion-Beam-Irradiated Photoresist Surface
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2002-06-30
著者
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BABA Akira
Center for Transdisciplinary Research, Niigata University
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Baba A
Niigata Univ. Niigata Jpn
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Asano Tanemasa
Center For Microelectronic Systems Kyushu Institute Of Technology
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Baba A
Hachinohe Inst. Technol. Aomori
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BABA Akiyoshi
Center for Microelectronic Systems, Kyushu Institute of Technology
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Baba A
Center For Transdisciplinary Research Niigata University
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Baba Akiyoshi
Center For Microelectronic Systems Kyushu Institute Of Technology
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Baba A
Kyushu Univ.
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IWAMOTO Masakazu
Center for Microelectronic Systems, Kyushu Institute of Technology
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TSUBAKI Kouichi
Center for Microelectronic Systems, Kyushu Institute of Technology
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Tsubaki Kouichi
Center For Microelectronic Systems Kyushu Institute Of Technology
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