Suppressing Plasma Induced Degradation of Gate Oxide Using Silicon-on-Insulator Structures

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1998-03-30

著者

• Asano Tanemasa

  Center For Microelectronic Systems Kyushu Institute Of Technology

• Asano Tanemasa

  Center For Microelectronics Systems Kyushu Institute Of Technology

• ARITA Kiyoshi

  Center for Microelectronics Systems, Kyushu Institute of Technology

• AKAMATSU Masashi

  Center for Microelectronics Systems, Kyushu Institute of Technology

• Arita K

  Waseda Univ. Tokyo Jpn

• Arita Kiyoshi

  Center For Microelectronic Systems Kyushu Institute Of Technology

• Akamatsu M

  Research And Development Center Stanley Electric Co. Ltd.

• Akamatsu Masashi

  Center for Microelectronic Systems, Kyushu Institute of Technology

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