Preparation of Pb(Zr_x, Ti_<1-x>)O_3 Thin Films by Source Gas Pulse-Introduced Metalorganic Chemical Vapor Deposition
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概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 2001-06-01
著者
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FUNAKUBO Hiroshi
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School, Tokyo Institut
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Funakubo H
Dep. Of Innovative And Engineered Materials Tokyo Inst. Of Technol.
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Funakubo H
Tokyo Inst. Technol. Yokohama Jpn
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Funakubo Hiroshi
Department Of Innovative And Engineered Materials Interdisciplinary Graduated School Of Science And
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舟窪 浩
東京工業大学大学院 総合理工学研究科 物質科学創造専攻
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Funakubo Hiroshi
Department Of Innovative And Engineered Materials
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舟窪 浩
東工大院総合理工学研究科
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ARATANI Masanori
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and
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NAGASHIMA Kuniharu
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and
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Aratani M
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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Aratani Masanori
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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Nagashima K
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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Nagashima Kuniharu
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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Funakubo Hiroshi
Department of Innovative and Engineered Material, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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