Characterization of Hafnium Oxide Thin Films by Source Gas Pulse Introduced Metalorganic Chemical Vapor Deposition Using Amino-Family Hf Precursors
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-09-30
著者
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TAKAHASHI Kenji
Department of Radiological Life Sciences, Hirosaki University Graduate School of Health Sciences
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FUNAKUBO Hiroshi
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School, Tokyo Institut
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Funakubo Hiroshi
Department Of Innovative And Engineered Materials Tokyo Institute Of Technology
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Funakubo Hiroshi
Department Of Innovative And Engineered Materials
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TOKUMITSU Eisuke
Department of Electrical and Electronic Engineering, Tokyo Institute of Technology
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Takahashi Kenji
Department Of Orthopaedics Graduate School Of Medical Science Kyoto Prefectural University Of Medici
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HINO Shiro
Precision and Intelligence Laboratory, Tokyo Institute of Technology
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NAKAYAMA Makoto
Precision and Intelligence Laboratory, Tokyo Institute of Technology
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Hino Shiro
Precision And Intelligence Laboratory Tokyo Institute Of Technology
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Nakayama Makoto
Precision And Intelligence Laboratory Tokyo Institute Of Technology
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Tokumitsu Eisuke
Department Of Innovative And Engineered Materials Tokyo Institute Of Technology
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Takahashi Kenji
Department Of Biophysics And Biochemistry Graduate School Of Science The University Of Tokyo
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Takahashi Kenji
Department Of Atomic Science And Nuclear Engineering Faculty Of Engineering Hokkaido University
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Takahashi Kenji
Department Of Applied Biological Chemistry Graduate School Of Agriculture Kinki University
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Funakubo Hiroshi
Department of Innovative and Engineered Material, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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