Good Ferroelectricity of Pb (Zr, Ti) O_3 Thin Films Fabricated by Highly Reproducible Deposition on Bottom Ir Electrode at 395℃
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概要
- 論文の詳細を見る
- Japan Society of Applied Physicsの論文
- 2003-09-15
著者
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FUNAKUBO Hiroshi
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School, Tokyo Institut
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Saito Keisuke
Application Laboratory Analytical Division Philips Japan Ltd.
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ASANO Gouji
Department of Innovative and Engineered Materials, Tokyo Institute of Technology
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OIKAWA Takahiro
Department of Innovative and Engineered Materials, Tokyo Institute of Technology
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SAITO Keisuke
PANalytical Japan
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