A 100-kV, 100-A/cm^2 Electron Optical System for the EB-X3 X-Ray Mask Writer
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-12-30
著者
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Kato Junichi
Ntt Telecommunications Energy Laboratories
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中山 喜萬
阪大工
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MOROSAWA Tetsuo
NTT LSI Laboratories
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SAITO Kenichi
NTT Telecommunications Energy Laboratories
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MATSUDA Tadahito
NTT Telecommunications Energy Laboratories
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NAKAYAMA Yoshinori
Super-fine SR Lithography Laboratory, Association of Super-Advanced Electronics Technologies(ASET),
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MATSUDA Tadahito
NTT System Electronics Laboratories
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Saito Keisuke
Application Laboratory Analytical Division Philips Japan Ltd.
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Saito K
Institute Of Industrial Science University Of Tokyo
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Saito Kenichi
Institute Of Industrial Science University Of Tokyo
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Nakayama Yoshinori
Aset Super-fine Sr Lithography Laboratory
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Saito Kunio
Ntt Microsystem Integration Laboratories
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Saito K
Akita Univ. Akita Jpn
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Saito Keisuke
Application Laboratory Bruker Axs
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Saito Kaichi
Kanagawa Industrial Technology Center
関連論文
- 814 二層カーボンナノチューブの塑性曲げ変形及びその回復過程(OS08.電子・原子・マルチシミュレーションに基づく材料特性評価(4))
- 281 カーボンナノチューブの変形のエネルギー論的検討(炭素構造体,OSO7 電子・原子・マルチシミュレーションに基づく材料特性評価)
- Supercell structure on continuous growth of Bi2Sr2Ca1Cu2Ox film
- Effect of strain on supercell structure of bismuth cuprate superconducting film (Special issue: Nano electronic materials)
- A Beam Drift Reduction Device for the X-Ray Mask E-Beam Writer, EB-X2
- Improving X-Ray Mask Pattern Placement Accuracy by Correcting Process Distortion in Electron Beam Writing
- Ta/SiN-Stucture X-Ray Masks for Sub-Half-Micron LSIs : Lithography Technology
- Critical-Dimension Controllability of Chemically Amplified Resists for X-Ray Membrane Mask Fabrication
- Precise Delineation Characteristics of Advanced Electron Beam Mask Writer EB-X3 for Fabricating 1x X-Ray Masks
- X-Ray Mask Fabrication Using New Membrane Process Techniques
- 28aXH-9 FEL用電界放出型電子ビーム源の開発 : カーボンナノチューブ陰極の基礎的特性
- Real-Time Feed-Forward Control LSIs for a Direct Wafer Exposure Electron Beam System
- Impact of 90ﾟ-Domain Wall Motion in Pb(Zr_Ti_)O_3 Film on the Ferroelectricity Induced by an Applied Electric Field
- BNを成膜したCNTエミッタの電界放射特性(電子管と真空ナノエレクトロニクス及びその評価技術)
- X-Ray Mask Pattern Accuracy Improvement by Superimposing Multiple Exposures Using Different Field Sizes
- Unique Shapes of Micro-Pits Formed in an Al-Pd-Mn Icosahedral Quasicrystal by Anodic Etching
- Determination of Quasi-Crystallographic Orientations of Al-Pd-Mn Icosahedral Phase by Means of Light Figure Method
- Sub-100-nm Device Fabrication using Proximity X-Ray Lithography at Five Levels
- Reduction of Image Shortening in Two-Dimensional Pattern Replication Using X-Ray Lithography
- Dissolution Characteristics and Surface Morphology of Chemically Amplified Resists in X-Ray Lithography
- カーボンナノチューブ成長時におけるアーク放電プラズマの粒子密度の電極軸方向分布
- Barrier modification at contacts between carbon nanotube and Pt electrode using well-controlled Joule heating
- Mechanical Properties of Sharpened Carbon Nanotube Tips
- ナノテクノロジーへの走査電子顕微鏡の応用
- Scanning Probe Microscope Tip with Carbon Nanotube Truss
- Nanoscale Variable Resistance Using Interlayer Sliding of Multiwall Nanotube
- カーボンナノコイル成長における触媒効果
- カーボンナノチューブの成長プロセス (特集 異方性工学のすすめ(2)プロセスと異方性)
- Interlayer Sliding Force of Individual Multiwall Carbon Nanotubes
- Extraction of Inner Shell from Multiwall Carbon Nanotubes for Scanning Probe Microscope Tip
- 走査型電子顕微鏡内に設置したナノスケール加工装置(ナノファクトリー)を用いたカーボンナノチューブの切断と先端先鋭化
- カーボンナノ構造物の合成と応用展開 : 炭素原子でできた直径1nmの筒 : カーボンナノチューブとは
- ポリシラン膜のキャリア輸送特性における側鎖基依存性及び配向効果
- カーボンナノ構造物の合成について
- 新イメージング材料 カーボンナノチューブの電界電子放出特性とその応用
- カーボンナノチューブによるプローブ顕微鏡探針の製作とその特性
- カーボンナノチューブのナノメカニックス
- カーボンナノチューブの電界電子放出特性とディスプレイ応用(半導体エレクトロニクス)
- Effect of Morphology on Field Emission Properties of Carbon Nanocoils and Carbon Nanotubes
- Rapid Growth of Vertically Aligned Carbon Nanotubes
- Synthesis of Carbon Tubule Nanocoils in High Yield Using Iron-Coated Indium Tin Oxide as Catalyst
- Thermal Decomposition of Poly(methylphenylsilane)
- Scanning Probe Microscope Lithography of Silicon Using a Combination of a Carbon Nanotube Tip and a Polysilane Film as a Mask
- Carbon-Nanotube Tip for Highly-Reproducible Imaging of Deoxyribonucleic Acid Helical Turns by Noncontact Atomic Force Microscopy
- Determination of Carbon Nanocoil Orientation by Dielectrophoresis
- Diameter control of carbon nanocoils by the catalyst of organic metals
- Low-Temperature Growth of Vertically Aligned Carbon Nanotubes Using Binary Catalysts
- Vertically Aligned Carbon Nanotubes Grown at Low Temperatures for Use in Displays
- Comparison of Field Emissions from Side Wall and Tip of an Individual Carbon Nanotube
- In Situ Study of Fe/ITO Catalysts for Carbon Nanocoil Growth By X-Ray Diffraction Analysis
- Instability of Field Emission from a Standalone Multiwalled Carbon Nanotube with an Insulator Barrier
- In Situ Study of Iron Catalysts for Carbon Nanotube Growth Using X-Ray Diffraction Analysis
- Comparison of Capped Carbon Nanotube with Open-Ended One for Field Emission
- Barrier Effect on Field Emission from Stand-alone Carbon Nanotube
- Daisylike Field-Emission Images from Standalone Open-Ended Carbon Nanotube
- Subgap Absorption Spectra in Polysilane Films
- Atomic Force Microscopy of Single-Walled Carbon Nanotubes Using Carbon Nanotube Tip
- High-Performance X-Ray Mask Fabrication Using TaGeN Absorber and Dummy Pattern Method for Sub-100nm Proximity X-Ray Lithography : Instrumentation, Measurement, and Fabrication Technology
- Simulation of X-Ray Mask Pattern Displacement
- A New Proximity Parameter Evaluation Method Utilizing Auxiliary Patterns for Dose Compensation
- A 100-kV, 100-A/cm^2 Electron Optical System for the EB-X3 X-Ray Mask Writer
- New Resist Technologies for 0.25-μm Wiring Pattern Fabrication with KrF Lithography
- Spatial Frequency Doubling Method by Image Superimposition for Sub-0.15-μm Optical Lithography
- Spatial Frequency Doubling Method for Sub-0.15-μm Optical Lithography
- The Effect of an Organic Base in Chemically Amplified Resist on Patterning Characteristics Using KrF Lithography
- Metal-Free Acid Generators for Chemically Amplified Monodispersal Polyhydroxystyrene-Based Positive Resist and Post-Exposure Delay Problem
- Nanoindentation of Polycarbonate Using Carbon Nanotube Tip
- Direct Nanolithography of Organic Polysilane Films Using Carbon Nanotube Tips
- Influence of Force Acting on Side Face of Carbon Nanotube in Atomic Force Microscopy
- Static Friction Force of Carbon Nanotube Surfaces
- Current-Induced Plastic Deformation of Double-Walled Carbon Nanotubes
- Mask Contamination Induced by X-Ray Exposure
- Overlay Repeatability in Mix-and-Match Exposure Using the SR Stepper: SS-1
- Improved Alignment Accuracy Using Lens-Distortion Correction for Electron-Beam Lithography in Mix-and-Match with an Optical Stepper
- Nanolithography of Organic Polysilane Films Using Carbon Nanotube Tips
- X-Ray Mask Inspection Using Replicated Resist Patterns
- Precise Angle and Position Detection Utilizing Optical Interference on Metal-Oxide-Semiconductor-Type Position-Sensitive Detectors
- Chemical Composition of Al_2O_3/InP Metal-Insulator-Semiconductor Interfaces Improved by Plasma and Ultraviolet Oxidation
- Hole Pattern Fabrication using Halftone Phase-Shifting Masks in KrF Lithography
- Atomic force microscopy with carbon nanotube probe resolves the subunit organization of protein complexes
- Stabilization of Deoxyribonucleic Acid Network on Mica Surface Using Post Ethanol Treatment : Surfaces, Interfaces, and Films
- 28pYX-8 ナノテクノロジー
- カーボンナノチューブのナノメカニックス
- Characteristics of a Monodisperse PHS-Based Positive Resist (MDPR) in KrF Excimer Laser Lithography
- 31a-D-11 カーボンナノチューブ合成におけるアーク放電発光の径方向分布(2)
- カーボンナノチューブ合成におけるアーク放電発光の径方向分布
- Patterning Characteristics of Hole Patterns in Synchrotron Radiation Lithography
- X-Ray Phase-Shifting Mask for 0.1-μm Pattern Replication under a Large Proximity Gap Condition
- Patterning Characteristics of a Chemically-Amplified Negative Resist in Synchrotron Radiation Lithography
- MOS-Type One-Dimensional Position-Sensitive Detectors with a Linearly Delectable Face of 30 mm Long
- 1012 カーボンナノコイル生成に関する分子動力学的研究(OS10. 電子・原子・マルチシミュレーションに基づく材料特性評価(3),オーガナイズドセッション講演)
- Novel Process for Fabricating Nanodevices Consisting of Carbon Nanotubes
- 平面型カーボンナノチューブ電子放出源の特性とディスプレイへの応用
- 平面型カーボンナノチューブ電子放出源の特性とディスプレィへの応用
- 31p-D-1 高周波電界により配向させたカーボンナノチューブからの電界放出
- カーボンナノチューブの交流電界による配向(II)
- 2p-D-6 カーボンナノチューブの電界配向(2)-交流電界中に於ける配向
- Molecular Surgery of Plasmid Deoxyribonucleic Acid Using Scanning Tunneling Microscopy with a Double-Helix Periodicity
- 228 高温引張下における単層カーボンナノチューブの超塑性構造遷移シミュレーション(OS15.電子・原子・マルチシミュレーションに基づく材料特性評価(8),オーガナイズドセッション)
- Sub-100-nm Device Fabrication using Proximity X-Ray Lithography at Five Levels