X-Ray Mask Pattern Accuracy Improvement by Superimposing Multiple Exposures Using Different Field Sizes

スポンサーリンク

概要

著者

関連論文

Improving X-Ray Mask Pattern Placement Accuracy by Correcting Process Distortion in Electron Beam Writing
Tantalum Dry-Etching Characteristics for X-Ray Mask Fabrication
Simulation of X-Ray Mask Distortion
Ta Film Properties for X-Ray Mask Absorbers : Lithography Technology
Ta Film Properties for X-Ray Mask Absorbers
Ta/SiN-Stucture X-Ray Masks for Sub-Half-Micron LSIs : Lithography Technology
High-Precision X-Ray Mask Technology : Lithography Technology
Critical-Dimension Controllability of Chemically Amplified Resists for X-Ray Membrane Mask Fabrication
Precise Delineation Characteristics of Advanced Electron Beam Mask Writer EB-X3 for Fabricating 1x X-Ray Masks
X-Ray Mask Fabrication Using New Membrane Process Techniques
Real-Time Feed-Forward Control LSIs for a Direct Wafer Exposure Electron Beam System
X-Ray Mask Pattern Accuracy Improvement by Superimposing Multiple Exposures Using Different Field Sizes
Sub-100-nm Device Fabrication using Proximity X-Ray Lithography at Five Levels
Reduction of Image Shortening in Two-Dimensional Pattern Replication Using X-Ray Lithography
Dissolution Characteristics and Surface Morphology of Chemically Amplified Resists in X-Ray Lithography
Very-Low-Energy Electron Beam Lithography Using a Retarding Field
A 0.25-μm BiCMOS Technology Using SOR X-Ray Lithography (Special Issue on Quarter Micron Si Device and Process Technologies)
Simulation of X-Ray Mask Pattern Displacement
A New Proximity Parameter Evaluation Method Utilizing Auxiliary Patterns for Dose Compensation
A 100-kV, 100-A/cm^2 Electron Optical System for the EB-X3 X-Ray Mask Writer
New Resist Technologies for 0.25-μm Wiring Pattern Fabrication with KrF Lithography
Spatial Frequency Doubling Method by Image Superimposition for Sub-0.15-μm Optical Lithography
Spatial Frequency Doubling Method for Sub-0.15-μm Optical Lithography
The Effect of an Organic Base in Chemically Amplified Resist on Patterning Characteristics Using KrF Lithography
Metal-Free Acid Generators for Chemically Amplified Monodispersal Polyhydroxystyrene-Based Positive Resist and Post-Exposure Delay Problem
Mask Contamination Induced by X-Ray Exposure
A Highly Accurate Stress Measurement System for Producing Precise X-Ray Masks
Overlay Repeatability in Mix-and-Match Exposure Using the SR Stepper: SS-1
X-Ray Mask Inspection Using Replicated Resist Patterns
Precise Angle and Position Detection Utilizing Optical Interference on Metal-Oxide-Semiconductor-Type Position-Sensitive Detectors
Chemical Composition of Al_2O_3/InP Metal-Insulator-Semiconductor Interfaces Improved by Plasma and Ultraviolet Oxidation
Hole Pattern Fabrication using Halftone Phase-Shifting Masks in KrF Lithography
Photon Stimulated Desorption of CO from Si Single Crystal
A Si Single-Crystal Shield-Pipe for Precise Measurement of Synchrotron Radiation Induced Gas Desorption
Characteristics of a Monodisperse PHS-Based Positive Resist (MDPR) in KrF Excimer Laser Lithography
Patterning Characteristics of Hole Patterns in Synchrotron Radiation Lithography
Effects of Synchrotron X-Ray Irradiation on Hot Carrier Reliability in Subquarter-Micrometer NMOSFETs (Special Issue on Sub-Half Micron Si Device and Process Technologies)
Resolution Enhancement of Hole Patterns in Sychrotron Radiation Lithography
Sub-100-nm-Scale Patterning Using a Low-Energy Electron Beam
X-Ray Phase-Shifting Mask for 0.1-μm Pattern Replication under a Large Proximity Gap Condition
Patterning Characteristics of a Chemically-Amplified Negative Resist in Synchrotron Radiation Lithography
MOS-Type One-Dimensional Position-Sensitive Detectors with a Linearly Delectable Face of 30 mm Long
High-Precision X-Ray Mask Technology
Ta/SiN-Structure X-Ray Masks for Sub-Half-Micron LSIs

もっと見る

スポンサーリンク