A Highly Accurate Stress Measurement System for Producing Precise X-Ray Masks

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1995-12-30

著者

• Oda Masatoshi

  NTT Advanced Technology Corp.,

• Yoshihara Hideo

  NTT Advanced Technology Corp.

• Okada Ikuo

  Ntt Lsi Laboratories

• Oda Masatoshi

  Ntt Advanced Technology Corp.:(present Address)ntt Lsi Laboratories

• UNE Atsunobu

  NTT Advanced Technology Corp.

• SHINOHARA Shinji

  TOTO LTD. Industrial Development Dept.

• NAKAYAMA Yasuo

  TOTO LTD. Industrial Development Dept.

• Shinohara S

  Toto Ltd. Industrial Development Dept.

関連論文

• Tantalum Dry-Etching Characteristics for X-Ray Mask Fabrication
• Simulation of X-Ray Mask Distortion
• Ta Film Properties for X-Ray Mask Absorbers : Lithography Technology
• Ta Film Properties for X-Ray Mask Absorbers
• Ta/SiN-Stucture X-Ray Masks for Sub-Half-Micron LSIs : Lithography Technology
• X-Ray Mask Pattern Accuracy Improvement by Superimposing Multiple Exposures Using Different Field Sizes
• A Highly Accurate Stress Measurement System for Producing Precise X-Ray Masks
• X-Ray Mask Inspection Using Replicated Resist Patterns

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