Nanolithography of Organic Polysilane Films Using Carbon Nanotube Tips

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概要

• 論文の詳細を見る

• The patterning of polysilane films is performed by means of the contact-mode-Scanning Probe Microscope (SPM) lithography technique. Both a carbon nanotube tip and a gold-coated Si tip are used. The polysilane film is directly patterned or grooved when the tip is negatively biased. It is considered that the grooves are fabricated by the scission of Si-Si bonds and volatilization of the species due to the emanating of electrons from the scanning tip. Compared with gold-coated Si tips, carbon nanotube tips produce narrower grooves with a higher scan speed and have a longer lifetime. The maximum ratio of groove depth to width can be obtained at a speed as high as 20 μm/s when using the carbon nanotube tip.

• 社団法人応用物理学会の論文
• 2000-06-30

著者

• 中山 喜萬

  阪大工

• 秋田 成司

  阪府大工

• Okazaki Ai

  Department Of Physics And Electronics Osaka Prefecture University

• Okazaki A

  Osaka Prefecture Univ. Osaka Jpn

• Okazaki Atsushi

  Department Of Physics Kyushu University

• AKITA Seiji

  Department of Physics and Electronics, Graduate School of Engineering, Osaka Prefecture University

• NAKAYAMA Yoshikazu

  Department of Physics and Electronics, Graduate School of Engineering, Osaka Prefecture University

• NISHIJIMA Hidehiro

  Department of Physics and Electronics, Osaka Prefecture University

• Nakayama Yoshikazu

  Department Of Electrical Engineering College Of Engineering University Of Osaka

• Akita Seiji

  Department Of Physics And Electronics College Of Engineering University Of Osaka Prefecture

• Nishijima Hidehiro

  Department Of Physics And Electronics Osaka Prefecture University

• Akita Shirabe

  Central Research Institute Of Electric Power Industry

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