Contributions of Silicon-Hydride Radicals to Hydrogenated Amorphous Silicon Film Formation in Windowless Photochemical Vapor Deposition System

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1994-02-15

著者

• Akiyama Tomoko

  Department Of Applied Physics Faculty Of Engineering The University Of Tokyo:(present Address)nikkei

• Kurihara Koji

  Faculty Of Technology Tokyo University Of Agricuture And Technology

• UENO Tomo

  Faculty of Technology, Tokyo University of Agriculture and Technology

• KAMISAKO Koichi

  Faculty of Technology, Tokyo University of Agriculture and Technology

• AKIYAMA Takeshi

  Yasuhara Chemical Co., Ltd.,

• Ueno T

  Tokyo Univ. Agriculture And Technol. Tokyo Jpn

• Tarui Y

  National Institute Of Advanced Industrial Science And Technology

• Kamisako K

  Tokyo Univ. Agriculture And Technol. Tokyo Jpn

• Kuroiwa K

  Faculty Of Technology Tokyo University Of Agricuture And Technology

• TARUI Yasuo

  National Institute of Advanced Industrial science and Technology

• KUROIWA Koichi

  Faculty of Technology, Tokyo University of Agriculture and Technology

• Akiyama Takeshi

  Yasuhara Chemical Co. Ltd.

• AKIYAMA Takeshi

  Faculty of Technology, Tokyo University of Agriculture and Technology

• SAWADO Yoshinori

  Faculty of Technology, Tokyo University of Agriculture and Technology

• TARUI Yasuo

  Faculty of Technology, Tokyo University of Agriculture and Technology

• Sawado Y

  Nippon Sanso Corp. Ibaraki

• Ueno Tomo

  Faculty Of Technology Tokyo University Of Agriculture And Technology

• Akiyama Takeshi

  Faculty Of Technology Tokyo University Of Agriculture And Technology

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