Acid-Catalyzed Reactions of Tetrahydropyranyl-Protected Polyvinylphenol in a Novolak-Resin-Based Positive Resist

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概要

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• This paper deals with an acid-catalyzed reaction mechanism of a polymeric dissolution inhibitor of a novolak-resin-based positive chemical amplification resist system. This resist system consists of a novolak matrix resin, tri(methanesulfonyloxy)benzene as an acid generator, and tetrahydropyranyl-protected polyvinylphenol (THP-M) as a polymeric dissolution inhibitor. The acid-catalyzed deprotection products of THP-M in the resist film are detected and their subsequent acid-catalyzed reactivities are evaluated. It is found that tetrahydropyranyl group are exchanged between THP-M and the matrix to yield a strong dissolution inhibitor, causing negative tone behavior at the overexposure dose. High-resolution patterns (0.3-μm contact holes) are achieved with high sensitivity (2.4 μC/cm^2 at 50 kV).

• 社団法人応用物理学会の論文
• 1992-12-30

著者

• Hayashi Nobuo

  University Of Electro-communications

• UENO Tomo

  Faculty of Technology, Tokyo University of Agriculture and Technology

• Shiraishi H

  National Res. Inst. Metals

• Shiraishi Hiroshi

  Central Research Laboratory Hitachi Ltd.

• UENO Takumi

  Central Research Laboratory, Hitachi Ltd.

• Hayashi N

  Saga Univ. Saga Jpn

• Ueno T

  Tokyo Univ. Agriculture And Technol. Tokyo Jpn

• HAYASHI Nobuaki

  Central Research Laboratory, Hitachi Ltd.

• SAKAMIZU Toshio

  Central Research Laboratory, Hitachi Ltd.

• YAMAGUCHI Hidenori

  Central Research Laboratory, Hitachi Ltd.

• Yamaguchi Hidenori

  Central Research Laboratory Hitachi Ltd.

• Sakamizu Toshio

  Central Research Laboratory Hitachi Ltd.

• Shiraishi Hiroshi

  Central Research Lab. Hitachi Ltd.

• Shiraishi Hiroshi

  Central Research Laboratory Hitachi Ltd

• HAYASHI Nobuyuki

  University of Electro-communications

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