Preparation of Al-O-N Films by Electron Cyclotron Resonance Plasma-Assisted Chemical Vapor Deposition
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-06-15
著者
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Zhang Wei
Institute For Materials Research Tohoku University
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Hirai Toshio
Institute For Materals Research Tohoku University
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Goto Takashi
Institute For Material Research Tohoku University
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ZHANG Wei
Institute for Materials Research, Tohoku University
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