Structural Properties of Silicon Oxide Films Prepared by the RF Substrate Biased ECR Plasma CVD Method

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1989-06-20

著者

• Hirao Takashi

  Central Research Laboratories Matsushita Electric Industrial Co. Ltd.

• Hiramatsu Takahiro

  Res. Inst. For Nanodevices Kochi Univ. Of Technol. 185 Miyanokuchi Tosayamada-cho Kami Kochi 782-850

• Hirao T

  Central Research Laboratories Matsushita Electric Industrial Co. Ltd.

• IZUMI Tomio

  Department of Electronic Engineering, Faculty of Engineering, Tokai University

• KITAGAWA Masatoshi

  Central Research Laboratories, Matsushita Electric Industrial Co., Ltd.

• OHMURA Takuichi

  Matsushita Technoresearch, Inc.

• Hirao T

  Research Institute For Nano-devices Kochi University Of Technology

• Izumi Teruo

  Superconductivity Research Laboratory Istec

• Izumi T

  Department Of Engineering Physics College Of Engineering Chubu University

• Kitagawa M

  Matsushita Electric Ind. Co. Moriguchi Jpn

• Kitagawa M

  Matsushita Electric Industrial Co.

• Kitagawa M

  Central Research Laboratories Matsushita Electric Industrial Co. Ltd.

• Kitagawa Masatoshi

  Corporate Production Engineering Laboratories Matsushita Electric Ind.co. Ltd.

• Kitagawa Masatoshi

  Central Research Laboratories Matsushita Electric Ind. Co. Ltd.

• Izumi T

  Superconductivity Research Laboratory International Superconductivity Technology Center

• Ohmura T

  Matsushita Technoresearch Inc.

• Ohmura Takuichi

  Matsushita Technoresearch Inc.

• Hirao Takashi

  Central Research Laboratories Matsushita Electric Ind. Co. Ltd.

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