Preparation of PbTiO_3 Thin Films by Ion- and Photoassisted Evaporation
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1991-12-30
著者
-
Hirao Takashi
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
-
Hiramatsu Takahiro
Res. Inst. For Nanodevices Kochi Univ. Of Technol. 185 Miyanokuchi Tosayamada-cho Kami Kochi 782-850
-
Hirao T
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
-
HAYASHI Shigenori
Central Research Laboratories, Matsushita Electric Industrial Co., Ltd.
-
Hirao T
Research Institute For Nano-devices Kochi University Of Technology
-
Hayashi Shinji
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kobe University
-
Hayashi S
Department Of Electrical And Electronics Engineering Faculty Of Engineering Kobe University
-
Iijima Kenji
Research Institute For Production Development
-
Iijima Kenji
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
-
Iijima Kenji
Environmental Technology Research Laboratory Matsushita Electric Industrial Co. Ltd.
-
Hayashi Shigenori
Central Research Laboratories Matsushita Electric Ind. Co.
-
Hayashi Shigenori
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corporation
-
Hayashi Shigenori
Faculty Of Engineering Osaka University
-
Hirao Takashi
Central Research Laboratories Matsushita Electric Ind. Co. Ltd.
関連論文
- Effect of pulsed substrate bias on film properties of SiO2 deposited by inductively coupled plasma chemical vapor deposition (Special issue: Active-matrix flatpanel displays and devices: TFT technologies and FPD materials)
- Analysis of subthreshold photo-leakage current in ZnO thin-film transistors using indium-ion implantation
- Low-Temperature Synthesis of Aligned Carbon Nanofibers on Glass Substrates by Inductively Coupled Plasma Chemical Vapor Deposition
- Low-Temperature Growth of Carbon Nanofiber by Thermal Chemical Vapor Deposition Using CuNi Catalyst
- Enhanced nucleation of microcrystalline silicon thin films deposited by inductively coupled plasma chemical vapor deposition with low-frequency pulse substrate bias
- Intense Green Cathodoluminescence from Low-Temperature-Deposited ZnO Film with Fluted Hexagonal Cone Nanostructures
- SiO_2 Insulator Film Synthesized at 100℃ Using Tetramethylsilane by Inductively Coupled Plasma Chemical Vapor Deposition
- Effect of energetic particle bombardment on microstructure of zinc oxide films deposited by RF magnetron sputtering
- Influence of thermal annealing on microstructures of zinc oxide films deposited by RF magnetron sputtering
- Density Control of Carbon Nanotubes through the Thickness of Fe/Al Multilayer Catalyst
- Formation of Nanoscale Diamond Particles without Substrate Heating by Cathodic Arc Deposition
- Correlation between Field Electron Emission and Structural Properties in Randomly and Vertically Oriented Carbon Nanotube Films
- Ultra-Low-Threshold Field Electron Emission from Pillar Array of Aligned Carbon Nanotube Bundles
- Formation of Vertically Aligned Carbon Nanotubes by Dual-RF-Plasma Chemical Vapor Deposition : Surfaces, Interfaces, and Films
- Development of New Apparatus for Field Emission Measurement
- Characterization of Surface Conductive Diamond Layer Grown by Microwave Plasma Chemical Vapor Deposition
- Electrical Properties of Boron-Implanted Homoepitaxial Diamond Films
- Effect of Hydrogen Plasma Treatment on Implantation Damage in Diamond Films Grown by Chemical Vapour Deposition
- Synthesis of β-SiC Layer in Silicon by Carbon Ion 'Hot' Implantation
- Low-Temperature Preparation of Pb(Zr,Ti)O_3 Thin Filmson (Pb,La)TiO_3 Buffer Layer by Multi-Jon-Beam Sputtering
- Structural Properties of Silicon Oxide Films Prepared by the RF Substrate Biased ECR Plasma CVD Method
- Properties of Hydrogenated Amorphous Silicon Prepared by ECR Plasma CVD Method : Condensed Matter
- Preparation of High-Conductivity p-Type a-Si:H Films by Penning Discharge
- Preparation of Pb-Based Ferroelectric Thin Films at Room Temperature Using Excimer-Laser-Assisted Multi-Ion-Beam Sputtering
- Preparation of La-Modified Lead Titanate Thin Films by Rf-Magnetron Sputtering Method and Their Pyroelectric Properties
- Preparation of Pyroelectric Pb_La_xTi_O_3 Thin Films from Ceramic Target by RF Magnetron Sputtering
- Characterization of Pb(Zr, Ti)O_3 Thin Films Prepared by Multi-Ion-Beam Sputtering
- Substrate Potential Effects on Low-Temperature Preparation of SrTiO_3 Thin Films by RF Magnetron Sputtering
- Ferroelectric PbTiO_3 Thin Films Prepared by Multi-Ion-Beam Sputter and Ion-Assisted Deposition
- Formation of n^+ a-Si:H Thin Layer by Ion-Doping Technique
- β-SiC Formation by Low-Energy Ion-Doping Technique
- Characteristics of Superconducting Gd-Ba-Cu-O Thin Films
- Plasma Irradiation Effects on Nd-Ce-Cu-O and La-Sr-Cu-O Thin Films
- Superconductivity in Nd-Ce-Cu-O Thin Films
- Plasma Ion-Doping Technique with 20 kHz Biased Electron Cyclotron Resonance Discharge : Techniques, Instrumentations and Measurement
- Effects of Deposition Method on the Properties of Silicon Nitride and Silicon Oxynitride Films : Surfaces, Interfaces and Films
- Incorporation of Constituent Atoms of Transparent Conductive Films into Hydrogenated Amorphous Silicon via Gas Phase : Surfaces, Interfaces and Films
- Coagulation of In Atoms in Hydrogenated Amorphous Silicon Islands Deposited on ITO Films : Condensed Matter
- Large Area Doping Technique Using an Ion Source of rf Discharge with Magnetic Field : Techniques, Instrumentations and Measurement
- The Orthorhombic-to-Tetragonal Phase Transition in Sputtered Gd-Ba-Cu-O Thin Films by Low Temperature Processing : Electrical Properties of Condensed Matter
- Thermal Stability of Hydrogen in Silicon Nitride Films Prepared by ECR Plasma CVD method : Surfaces, Interfaces and Films
- Properties of Silicon Oxynitride Films Prepared by ECR Plasma CVD Method : Surfaces, Interfaces and Films
- Hydrogen Concentration and Bond Configurations in Silicon Nitride Films Prepared by ECR Plasma CVD Method
- Photoluminescence from Si Nanocrystals Embedded in SiO_xN_y Thin Films
- Direct Synthesis of Carbon Nanotubes on Ti-Coated Metal Substrates and Its -Application to Electrochemical Double Layer Capacitors
- Synthesis of Aligned Carbon Nanofibers at 200℃
- Characterization of Homoepitaxial Diamond Films Grown from Carbon Monoxide
- Scanning Tunneling Microscopy Study of the c(4X4) Structure Formation in the Sub-Monolayer Sb/Si(100) System : Surfaces, Interfaces, and Films
- Mg/Si(100) Reconstructions Studied by Scanning Tunneling Microscopy
- High Channel Mobility in Inversion Layer of SiC MOSFETs for Power Switching Transistors
- High Channel Mobility in Inversion Layer of SiC MOSFETs for Power Switching Transistors
- Crystallographic Orientations of Mg0 Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition
- Molecular Cloning, Sequencing and Characterization of the Genes for Adenosylcobalamin-dependent Diol Dehydratase of Klebsiella pneumoniae
- Influence of Deposition Conditions on the Properties of Silicon Nitride Films Prepared by the ECR Plasma CVD Method
- Effect of Raw-Fuel Flow Rate on Soot Formation Reaction in Carbon Black Furnace
- Ni_Co_x-C Nanogranular Thin Films Prepared by a Co-S puttering Method:Improvement in Magnetic Properties by Optimizing the Alloy Ratio : Magnetism
- Internal Photoemission from Ag Nanoparticles Embedded in Al_2O_3 Film : Surfaces, Interfaces, and Films
- Thin Films of Carbon Nanocapsules and Onion-Like Graphitic Particles Prepared by the Cosputtering Method
- Substrate Temperature Dependence of Deuteron Bonding States in Deuterated Amorphous Silicon Studied by ^2H Nuclear Magnetic Resonance
- ^1H Nuclear Magnetic Resonance Study of Hydrogen Distribution in Partially Deuterated Hydrogenated Amorphous Silicon
- ^P Nuclear Magnetic Resonance Study of Local Bonding Configuration of Phosphorus in Amorphous Silicon-Hydrogen-Phosphorus Alloys
- Silicon-29 Nuclear Magnetic Resonance Study of Amorphous-Microcrystalline Mixed-Phase Hydrogenated Silicon
- ^1H Nuclear Magnetic Resonance Study of Hydrogenated Amorphous Silicon Deposited from a Xe-diluted Silane Plasma
- Structural Control of Epitaxially Grown Sputtered PbTiO_3 Thin Films
- Coevaporation Effect of Te on P-Type CdTe:Cu Film Formation
- Silver-Induced 3 × 3 Phase on 6H-SiC(0001)√ × √ Surface
- Direct Observation of Strained Layer Formation at the Initial Stage of In Thin Film Growth on Si(100)
- Dielectric Breakdown of Polyacetylene
- Preparation of PbTiO_3 Thin Films by Ion- and Photoassisted Evaporation
- Preparation and Characterization of Pb-Based Ferroelectric Thin Films : Thin Films
- Preparation and Characterization of CuInSe_2 Thin Films by Molecular-Beam Deposition Method
- Low Temperature Growth of Amorphous and Polycrystalline Silicon Films from a Modified Inductively Coupled Plasma
- Lower-Temperature Growth of Hydrogenated Amorphous Silicon Films from Inductively Coupled Silane Plasma
- Simple Direct Monitoring of SiH_3 Radical and Particulates in a Silane Plasma with Ultraviolet Transmission Spectroscopy
- Positive bias instability of bottom-gate zinc oxide thin-film transistors with a SiOx/SiNx-stacked gate insulator (Special issue: Active-matrix flatpanel displays and devices: TFT technologies and FPD materials)
- Nitrogen Doping in GaP Microcrystals : A Photoluminescence Study
- Raman Study of Crystal Structure of Gas-Evaporated MoO_3 Microcrystals
- Photoluminescence of Si-Rich SiO_2 Films : Si Clusters as Luminescent Centers
- Raman Scattering from Acoustic Phonons Confined in Microcrystals : Small Gold and Silver Particles Embedded in SiO_2 Thin Films
- In Situ Infrared Study of Surface Oxide Formation on Gas-Evaporated Si Microcrystals
- Electrical Transport and Electron Spin Resonance in Electron-Beam-Irradiated Polyacetylene in the Presence of SF_6 Gas
- Compound-Source Molecular Beam Epitaxy for ZnCdSe/ZnSSe/ZnMgSSe Laser Structure
- Optical Properties of Bi-Sr-Ca-Cu-O Thin Films
- Growth of Ge Microcrystals in SiO_2 Thin Film Matrices : A Raman and Electron Microscopic Study
- Quantum Size Effects in Ge Microcrystals Embedded in SiO_2 Thin Films
- Magnetic Relaxation of High T_c Superconducting Thin Films
- Cu 2p Photoelectron and 2p_-Valence-Valence Auger Electron Spectra of Cuprate Superconductors
- Chemical Interactions between Arsenic and Boron Implanted in Silicon during Annealing
- Electron Spectroscopy of Nd_Ce_xCuO_(x=0,0.15,and0.23)Thin Films
- Diamagnetic Properties of Nd-Ce-Cu-O Superconducting Thin Films with Electron Carriers
- Role of Ions and Radical Species in Silicon Nitride Deposition by ECR Plasma CVD Method
- Low Temperature Preparation of Hydrogenated Amorphous Silicon by Microwave Electron-Cyclotron-Resonance Plasma CVD
- Preparation and Properties of Cd_Mn_xS Thin Films
- Characterization of GdBa_2Cu_3O_ Thin Films by Raman Scattering
- Crystal Structure Analysis of Multiwalled Carbon Nanotube Forests by Newly Developed Cross-Sectional X-ray Diffraction Measurement
- Frequency Control Method of Magnetostatic Wave Oscillators Using External pin Diode Circuits
- Simulation of Magnetostatic Wave Envelope Soliton Propagation in Yttrium Iron Garnet Films
- (100) Preferred Orientation of Spinel-Type Iron Oxide Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition
- Preparation of Co Ferrite Films by Plasma-Enhanced Metalorganic Chemical Vapor Deposition
- The Concentration Profiles of Phosphorus, Arsenic and Recoiled Oxygen Atoms in Si by Ion Implantation into SiO_2-Si