In Situ Infrared Study of Surface Oxide Formation on Gas-Evaporated Si Microcrystals

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1993-11-15

著者

• KAWATA Satoshi

  Department of Chemistry, Graduate School of Science, Osaka University

• Kim Hong

  Micro-electronics Technical Laboratory Etri

• Kim Hong

  Opto-electronics Section Electronics And Telecommunications Research Institute

• Kim Hong

  Micro-electronics Technical Laboratory

• Yamamoto Keiichi

  Department Of Electronics Faculty Of Engineering Kobe University

• Kawata Satoshi

  Department Of Applied Physics Graduate School Of Engineering Osaka University

• Hayashi Shinji

  Department Of Electrical And Electronic Engineering Faculty Of Engineering Kobe University

• Hayashi Shinji

  Department Of Electrical And Electronics Engineering Faculty Of Engineering Kobe University

• Kim H

  Electronics And Telecommunications Res. Inst. Taejon Kor

• Kawata Satoshi

  Department Of Applied Physics Osaka University

• KIM Han

  Division of Science of Materials, The Graduate School of Science and Technology, Kobe University

• Yamamoto Keiichi

  Department Of Biology Chiba University

• Kawata Satoshi

  Department Of Electrical And Electronics Engineering Faculty Of Engineering Kobe University

• Kawata Satoshi

  Department Of Appkied Physicy Osaka University

• Hayashi Shinji

  Department Of Bioscience And Biotechnology Faculty Of Engineering Okayama University

• Hayashi Shinji

  Department Of Anatomy And Embryology Tokyo Metropolitan Institute For Neuroscience

• Yamamoto Keiichi

  Department Of Electrical And Electronics Engineering Faculty Of Engineering Kobe University

• YAMAMOTO Keiichi

  Department of Bioengineering, Faculty of Engineering, Soka University

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