Chemical Interactions between Arsenic and Boron Implanted in Silicon during Annealing
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1992-08-01
著者
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Hirao Takashi
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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Ando Yasuo
Nissin Electric Co. Ltd.
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YOKOTA Katsuhiro
Faculty of Engineering, Kansai University
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Matsuda Kouji
Nissin Electric Co. Ltd.
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SUNAGAWA Yoshiyuki
Faculty of Engineering, Kansai University
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Yokota Katsuhiro
Faculty Of Engineering Kansai University
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Sunagawa Yoshiyuki
Faculty Of Engineering Kansai University
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Hirao Takashi
Central Research Laboratory Matsushita Electric Industrial Co. Ltd.
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Hirao Takashi
Central Research Laboratories Matsushita Electric Ind. Co. Ltd.
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Yokota Katsuhiro
Faculty of Engineering and High-Technology Research Center, Kansai University, Suita, Osaka 564-8680, Japan
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