Positive bias instability of bottom-gate zinc oxide thin-film transistors with a SiOx/SiNx-stacked gate insulator (Special issue: Active-matrix flatpanel displays and devices: TFT technologies and FPD materials)

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概要

• 論文の詳細を見る

著者

• Hirao Takashi

  Central Research Laboratories Matsushita Electric Industrial Co. Ltd.

• Hiramatsu Takahiro

  Res. Inst. For Nanodevices Kochi Univ. Of Technol. 185 Miyanokuchi Tosayamada-cho Kami Kochi 782-850

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