SiO_2 Insulator Film Synthesized at 100℃ Using Tetramethylsilane by Inductively Coupled Plasma Chemical Vapor Deposition
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概要
- 論文の詳細を見る
- Japan Society of Applied Physicsの論文
- 2007-03-25
著者
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Furuta Mamoru
Research Institute For Nano-devices Kochi University Of Technology
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Hirao Takashi
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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Hirao Takashi
Department Of Electrical Engineering Osaka University
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FURUTA Hiroshi
Research Institute, Kochi University of Technology
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HIRAO Takashi
Research Institute, Kochi University of Technology
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Hiramatsu Takahiro
Res. Inst. For Nanodevices Kochi Univ. Of Technol. 185 Miyanokuchi Tosayamada-cho Kami Kochi 782-850
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MATSUDA Tokiyoshi
Research Institute for Nano-devices, Kochi University of Technology
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HIRAMATSU Takahiro
Kochi Casio Co., Ltd.
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Matsuda Tokiyoshi
Research Institute Kochi University Of Technology
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Hirao T
Research Institute For Nano-devices Kochi University Of Technology
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