Enhanced nucleation of microcrystalline silicon thin films deposited by inductively coupled plasma chemical vapor deposition with low-frequency pulse substrate bias

スポンサーリンク

概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文

著者

• Furuta Mamoru

  Research Institute For Nano-devices Kochi University Of Technology

• Hirao Takashi

  Central Research Laboratories Matsushita Electric Industrial Co. Ltd.

• Hirao Takashi

  Department Of Electrical Engineering Osaka University

• Hiramatsu Takahiro

  Res. Inst. For Nanodevices Kochi Univ. Of Technol. 185 Miyanokuchi Tosayamada-cho Kami Kochi 782-850

関連論文

• Effect of pulsed substrate bias on film properties of SiO2 deposited by inductively coupled plasma chemical vapor deposition (Special issue: Active-matrix flatpanel displays and devices: TFT technologies and FPD materials)
• Analysis of subthreshold photo-leakage current in ZnO thin-film transistors using indium-ion implantation
• Low-Temperature Synthesis of Aligned Carbon Nanofibers on Glass Substrates by Inductively Coupled Plasma Chemical Vapor Deposition
• Low-Temperature Growth of Carbon Nanofiber by Thermal Chemical Vapor Deposition Using CuNi Catalyst
• Enhanced nucleation of microcrystalline silicon thin films deposited by inductively coupled plasma chemical vapor deposition with low-frequency pulse substrate bias
• Intense Green Cathodoluminescence from Low-Temperature-Deposited ZnO Film with Fluted Hexagonal Cone Nanostructures
• SiO_2 Insulator Film Synthesized at 100℃ Using Tetramethylsilane by Inductively Coupled Plasma Chemical Vapor Deposition
• Effect of energetic particle bombardment on microstructure of zinc oxide films deposited by RF magnetron sputtering
• Influence of thermal annealing on microstructures of zinc oxide films deposited by RF magnetron sputtering
• Density Control of Carbon Nanotubes through the Thickness of Fe/Al Multilayer Catalyst
• Formation of Nanoscale Diamond Particles without Substrate Heating by Cathodic Arc Deposition
• Correlation between Field Electron Emission and Structural Properties in Randomly and Vertically Oriented Carbon Nanotube Films
• Ultra-Low-Threshold Field Electron Emission from Pillar Array of Aligned Carbon Nanotube Bundles
• Formation of Vertically Aligned Carbon Nanotubes by Dual-RF-Plasma Chemical Vapor Deposition : Surfaces, Interfaces, and Films
• Development of New Apparatus for Field Emission Measurement
• Characterization of Surface Conductive Diamond Layer Grown by Microwave Plasma Chemical Vapor Deposition
• Electrical Properties of Boron-Implanted Homoepitaxial Diamond Films
• Effect of Hydrogen Plasma Treatment on Implantation Damage in Diamond Films Grown by Chemical Vapour Deposition
• Synthesis of β-SiC Layer in Silicon by Carbon Ion 'Hot' Implantation
• Low-Temperature Preparation of Pb(Zr,Ti)O_3 Thin Filmson (Pb,La)TiO_3 Buffer Layer by Multi-Jon-Beam Sputtering
• Structural Properties of Silicon Oxide Films Prepared by the RF Substrate Biased ECR Plasma CVD Method
• Properties of Hydrogenated Amorphous Silicon Prepared by ECR Plasma CVD Method : Condensed Matter
• Preparation of High-Conductivity p-Type a-Si:H Films by Penning Discharge
• Preparation of Pb-Based Ferroelectric Thin Films at Room Temperature Using Excimer-Laser-Assisted Multi-Ion-Beam Sputtering
• Preparation of La-Modified Lead Titanate Thin Films by Rf-Magnetron Sputtering Method and Their Pyroelectric Properties
• Preparation of Pyroelectric Pb_La_xTi_O_3 Thin Films from Ceramic Target by RF Magnetron Sputtering
• Characterization of Pb(Zr, Ti)O_3 Thin Films Prepared by Multi-Ion-Beam Sputtering
• Substrate Potential Effects on Low-Temperature Preparation of SrTiO_3 Thin Films by RF Magnetron Sputtering
• Ferroelectric PbTiO_3 Thin Films Prepared by Multi-Ion-Beam Sputter and Ion-Assisted Deposition
• Formation of n^+ a-Si:H Thin Layer by Ion-Doping Technique
• β-SiC Formation by Low-Energy Ion-Doping Technique
• Characteristics of Superconducting Gd-Ba-Cu-O Thin Films
• Plasma Irradiation Effects on Nd-Ce-Cu-O and La-Sr-Cu-O Thin Films
• Superconductivity in Nd-Ce-Cu-O Thin Films
• Plasma Ion-Doping Technique with 20 kHz Biased Electron Cyclotron Resonance Discharge : Techniques, Instrumentations and Measurement
• Effects of Deposition Method on the Properties of Silicon Nitride and Silicon Oxynitride Films : Surfaces, Interfaces and Films
• Incorporation of Constituent Atoms of Transparent Conductive Films into Hydrogenated Amorphous Silicon via Gas Phase : Surfaces, Interfaces and Films
• Coagulation of In Atoms in Hydrogenated Amorphous Silicon Islands Deposited on ITO Films : Condensed Matter
• Large Area Doping Technique Using an Ion Source of rf Discharge with Magnetic Field : Techniques, Instrumentations and Measurement
• The Orthorhombic-to-Tetragonal Phase Transition in Sputtered Gd-Ba-Cu-O Thin Films by Low Temperature Processing : Electrical Properties of Condensed Matter
• Thermal Stability of Hydrogen in Silicon Nitride Films Prepared by ECR Plasma CVD method : Surfaces, Interfaces and Films
• Properties of Silicon Oxynitride Films Prepared by ECR Plasma CVD Method : Surfaces, Interfaces and Films
• Hydrogen Concentration and Bond Configurations in Silicon Nitride Films Prepared by ECR Plasma CVD Method
• Direct Synthesis of Carbon Nanotubes on Ti-Coated Metal Substrates and Its -Application to Electrochemical Double Layer Capacitors
• Synthesis of Aligned Carbon Nanofibers at 200℃
• Characterization of Homoepitaxial Diamond Films Grown from Carbon Monoxide
• Scanning Tunneling Microscopy Study of the c(4X4) Structure Formation in the Sub-Monolayer Sb/Si(100) System : Surfaces, Interfaces, and Films
• Mg/Si(100) Reconstructions Studied by Scanning Tunneling Microscopy
• High Channel Mobility in Inversion Layer of SiC MOSFETs for Power Switching Transistors
• High Channel Mobility in Inversion Layer of SiC MOSFETs for Power Switching Transistors
• Crystal structure analysis of multiwalled carbon nanotube forests by newly developed cross-sectional X-ray diffraction measurement
• Crystallographic Orientations of Mg0 Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition
• Influence of Deposition Conditions on the Properties of Silicon Nitride Films Prepared by the ECR Plasma CVD Method
• Coevaporation Effect of Te on P-Type CdTe:Cu Film Formation
• Silver-Induced 3 × 3 Phase on 6H-SiC(0001)√ × √ Surface
• Direct Observation of Strained Layer Formation at the Initial Stage of In Thin Film Growth on Si(100)
• Preparation of PbTiO_3 Thin Films by Ion- and Photoassisted Evaporation
• Preparation and Characterization of Pb-Based Ferroelectric Thin Films : Thin Films
• Preparation and Characterization of CuInSe_2 Thin Films by Molecular-Beam Deposition Method
• Low Temperature Growth of Amorphous and Polycrystalline Silicon Films from a Modified Inductively Coupled Plasma
• Lower-Temperature Growth of Hydrogenated Amorphous Silicon Films from Inductively Coupled Silane Plasma
• Simple Direct Monitoring of SiH_3 Radical and Particulates in a Silane Plasma with Ultraviolet Transmission Spectroscopy
• Positive bias instability of bottom-gate zinc oxide thin-film transistors with a SiOx/SiNx-stacked gate insulator (Special issue: Active-matrix flatpanel displays and devices: TFT technologies and FPD materials)
• Chemical Interactions between Arsenic and Boron Implanted in Silicon during Annealing
• A $128\times 96$ Pixel Stack-Type Color Image Sensor: Stack of Individual Blue-, Green-, and Red-Sensitive Organic Photoconductive Films Integrated with a ZnO Thin Film Transistor Readout Circuit
• Role of Ions and Radical Species in Silicon Nitride Deposition by ECR Plasma CVD Method
• Low Temperature Preparation of Hydrogenated Amorphous Silicon by Microwave Electron-Cyclotron-Resonance Plasma CVD
• Preparation and Properties of Cd_Mn_xS Thin Films
• Positive Bias Instability of Bottom-Gate Zinc Oxide Thin-Film Transistors with a SiOx/SiNx-Stacked Gate Insulator
• Crystal Structure Analysis of Multiwalled Carbon Nanotube Forests by Newly Developed Cross-Sectional X-ray Diffraction Measurement
• Crystal Structure Analysis of Multiwalled Carbon Nanotube Forests by Newly Developed Cross-Sectional X-ray Diffraction Measurement
• Enhanced Nucleation of Microcrystalline Silicon Thin Films Deposited by Inductively Coupled Plasma Chemical Vapor Deposition with Low-Frequency Pulse Substrate Bias
• Frequency Control Method of Magnetostatic Wave Oscillators Using External pin Diode Circuits
• Simulation of Magnetostatic Wave Envelope Soliton Propagation in Yttrium Iron Garnet Films
• (100) Preferred Orientation of Spinel-Type Iron Oxide Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition
• Preparation of Co Ferrite Films by Plasma-Enhanced Metalorganic Chemical Vapor Deposition
• Low-Temperature Growth of Carbon Nanofiber by Thermal Chemical Vapor Deposition Using CuNi Catalyst
• The Concentration Profiles of Phosphorus, Arsenic and Recoiled Oxygen Atoms in Si by Ion Implantation into SiO_2-Si
• SiO2 Insulator Film Synthesized at 100 °C Using Tetramethylsilane by Inductively Coupled Plasma Chemical Vapor Deposition
• Structural Analysis of High-Density Vertically Aligned Carbon Nanotubes Grown by Thermal Chemical Vapor Deposition with Fe/Al Multilayer Catalyst
• Influence of Thermal Annealing on Microstructures of Zinc Oxide Films Deposited by RF Magnetron Sputtering
• Effect of Energetic Particle Bombardment on Microstructure of Zinc Oxide Films Deposited by RF Magnetron Sputtering

もっと見る 閉じる

スポンサーリンク