Neutralization and Discharge of Electron Traps in Hydrogenated Diamond-Like Carbon Films Deposited on Ground Electrode by Plasma-Enhanced Chemical Vapor Deposition
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概要
- 論文の詳細を見る
Low-dielectric-constant hydrogenated diamond-like carbon (DLC:H) films were deposited on p-type Si substrates on a grounded electrode by plasma-enhanced chemical vapor deposition. The capacitance–voltage ($C$–$V$) curves for a returning sweep of bias voltages from positive to negative was positioned above that for a going sweep of bias voltages from negative to positive because many electron traps were present in the DLC:H films. The $C$–$V$ curve for the going bias voltage sweep first approached that for the returning bias voltage sweep with time, and then such curves separated from each other.
- 2007-04-15
著者
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Nakatani Takahiro
Faculty of Engineering and HRC, Kansai University, Suita, Osaka 564-8680, Japan
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Miyashita Fumiyoshi
Faculty of Informatics, Kansai University, Takatsuki, Osaka 569-1095, Japan
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Yokota Katsuhiro
Faculty of Engineering and High-Technology Research Center, Kansai University, Suita, Osaka 564-8680, Japan
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