Ohmura T | Matsushita Technoresearch Inc.
スポンサーリンク
概要
関連著者
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Hirao Takashi
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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Hiramatsu Takahiro
Res. Inst. For Nanodevices Kochi Univ. Of Technol. 185 Miyanokuchi Tosayamada-cho Kami Kochi 782-850
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Hirao T
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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IZUMI Tomio
Department of Electronic Engineering, Faculty of Engineering, Tokai University
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KITAGAWA Masatoshi
Central Research Laboratories, Matsushita Electric Industrial Co., Ltd.
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OHMURA Takuichi
Matsushita Technoresearch, Inc.
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Izumi Teruo
Superconductivity Research Laboratory Istec
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Izumi T
Department Of Engineering Physics College Of Engineering Chubu University
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Kitagawa M
Matsushita Electric Ind. Co. Moriguchi Jpn
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Kitagawa M
Matsushita Electric Industrial Co.
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Kitagawa M
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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Kitagawa Masatoshi
Corporate Production Engineering Laboratories Matsushita Electric Ind.co. Ltd.
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Kitagawa Masatoshi
Central Research Laboratories Matsushita Electric Ind. Co. Ltd.
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Izumi T
Superconductivity Research Laboratory International Superconductivity Technology Center
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Ohmura T
Matsushita Technoresearch Inc.
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Ohmura Takuichi
Matsushita Technoresearch Inc.
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Hirao Takashi
Central Research Laboratories Matsushita Electric Ind. Co. Ltd.
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KAMADA Takeshi
Central Research Laboratories, Matsushita Electric Industrial Co., Ltd.
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SETSUNE Kentaro
Central Research Laboratories, Matsushita Electric Industrial Co., Ltd.
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WASA Kiyotaka
Central Research Laboratories, Matsushita Electric Industrial Co., Ltd.
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Hirao T
Research Institute For Nano-devices Kochi University Of Technology
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Wasa Kiyotaka
Research Institute Of Innovative Technology For The Earth
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Kamada Takeshi
Central Research Laboratories Matsushita Electric Industrial Co. Lid.
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Setsune Kentaro
The Central Research Laboratories Matsushita Electric Industries Co. Ltd.
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Setsune Kentaro
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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Wasa Kiyotaka
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
著作論文
- Structural Properties of Silicon Oxide Films Prepared by the RF Substrate Biased ECR Plasma CVD Method
- Properties of Silicon Oxynitride Films Prepared by ECR Plasma CVD Method : Surfaces, Interfaces and Films