Sugai Hideo | Department Of Electrical Engineering Faculty Of Engineering Nagoya University

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概要

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著作論文

Diagnostic of Surface Wave Plasma for Oxide Etching in Comparison with Inductive RF Plasma
Electron-Impact Dissociation of Methane into CH_3 and CH_2 Radicals : II. Absolute Cross Sections
Electron-Impact Dissociation of Methane into CH_3 and CH_2 Radicals : I. Relative Cross Sections
Dissociative Ion Yields on Metal Surfaces Bombarded with Low-Energy Fluorocarbon Ions
Observation of Ion Scattering from Metal Surfaces Bombarded with Low-Energy Hydrocarbon Ions
Generation of a Large Electron Beam for Plasma Processing
RF Plasma Production at Ultralow Pressures with Surface Magnetic Confinement
Hydrogen-Reduced Carbonization by Acetylene Discharges
Wall Heating Effect on Crystallization of Low-Temperature Deposited Silicon Films from an Inductuvely-Coupled Plasma
Lower Temperature Deposition of Polycrystalline Silicon Films from a Modified Inductively Coupled Silane Plasma
LOW-TEMPERATURE FORMATION OF poly-Si FILMS BY INDUCTIVELY-COUPLED SILANE PLASMA
Drastic Change in CF_2 and CF_3 Kinetics Induced by Hydrogen Addition into CF_4 Etching Plasma
Spatial Distribution and Surface Loss of CF_3 and CF_2 Radicals in a CF_4 Etching Plasma
High Speed Cleaning of Boronized Wall with a CF_4 Containing Plasma
Rapid Cleaning of Boronized Walls with a Chlorine/Hydrogen Glow Discharge
A Radio Frequency Driven DC Electron Beam Source
Mode Conversion and Electron Heating by Oblique Injection of the Ordinary Mode into Over-Dense Plasma
Electron Heating by Oblique Injection of Ordinary Mode into Overdense Plasma
Lower-Temperature Growth of Hydrogenated Amorphous Silicon Films from Inductively Coupled Silane Plasma
Simple Direct Monitoring of SiH_3 Radical and Particulates in a Silane Plasma with Ultraviolet Transmission Spectroscopy
Cross Section Measurements for Electron-Impact Dissociation of CHF_3 into Neutral and Ionic Radicals
Cross Sections for Electron-Impact Dissociation of Alternative Etching Gas, C_3HF_7O
Test-Wave Measurements of Microwave Absorption Efficiency in a Planar Surface-Wave Plasma Reactor
Production of Low-Pressure Planar Non-Magnetized Plasmas Sustained under a Dielectric-Free Metal-Plasma Interface
Production and Control of Low-Pressure Ar and CF_4 Plasmas Using Surface Waves
Cross Section Measurements for Electron-Impact Dissociation of C_4F_8 into Neutral and Ionic Radicals
High-Speed Etching of Indium-Tin-Oxide Thin Films Using an Inductively Coupled Plasma ( Plasma Processing)
Whistler Wave Trapping in a Narrow Density Trough
Observation of Transit-Time Electron Heating by Localize RF Field
Transit-Time RF Heating of Plasma Based on Fermi Acceleration
Dispersion and Attenuation of Whistler Waves in a Finite Plasma
Optical Emission and Microwave Field Intensity Measurements in Surface Wave-Excited Planar Plasma
Pressure Dependence of Carbon Film Coating by a Toroidal Methane Discharge
Free Radicals in an Inductively Coupled Etching Plasma
Excitation of Azimuthally Propagating Ion-Cyclotron Drift Waves in Large Magnetized Plasma : Nuclear Science, Plasmas and Electric Discharges
Ion Cyclotron Drift Waves in Plasmas with Controlled Radial Density Distributions
Plasma Oscillation Method for Measurements of Absolute Electron Density in Plasma
Mechanism of Cross-Field Heating of Ions
Wall Temperature Dependence of Boronization Using Decaborane and Diborane
Surface Wave Eigenmodes in a Finite-Area Plane Microwave Plasma

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