Cross Section Measurements for Electron-Impact Dissociation of CHF_3 into Neutral and Ionic Radicals

スポンサーリンク

概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1994-06-15

著者

• 後藤 誠

  北陸職業能力開発大学校

• Nakamura Keiji

  Department of Electrical Engineering, Nagoya University

• Sugai Hideo

  Department of Electrical Engineering, Nagoya University

• Toyoda Haruhisa

  Department Of Material Physics Faculty Of Engineering Science Osaka University

• GOTO Masashi

  Department of General Medicine and Clinical Epidemiology, Kyoto University Graduate School of Medici

• Toyoda H

  Department Of Electrical Engineering School Of Engineering Nagoya Univeristy

• Toyoda H

  Nagoya Univ. Nagoya Jpn

• Toyoda Hirotaka

  Department Of Electrical Engineering Nagoya University

• Sugai Hideo

  Department Of Electrical Engineering Faculty Of Engineering Nagoya University

• Goto M

  Matsushita Electric Industrial Co.

• Nakamura Keiji

  Department Of Electrical Electronics And Information Engineering Graduate School Of Engineering Osak

• Nakamura Keiji

  Department Of Electrical Engineering Nagoya University

• GOTO Masashi

  Matsushita Electric Industrial Co.

• Toyoda Hirotaka

  Department Of Electrical Engineering And Computer Science Nagoya University

• Sugai Hideo

  Department O Electrical Engineering Nagoya University

• Goto Masashi

  Department Of General Medicine And Clinical Epidemiology Kyoto University Graduate School Of Medicin

• Goto Masashi

  Department Of Comprehensive Care And Education Tenri Hospital

• Nakamura Keiji

  Department Of Biology And Geosciences Graduate School Of Science Osaka City University:present Addre

• Goto Masashi

  Department of Applied Chemistry, Faculty of Engineering, Nagoya University

関連論文

• 23pHL-7 CDW物質1T-TaS_2におけるTa4f内殻準位の時間分解光電子分光(23pHL 光電子分光(表面・薄膜・低次元物質・新分光法),領域5(光物性))
• 23aGE-4 Ta_2NiSe_5のX線吸収及び発光(23aGE 新物質など1,領域8(強相関系:高温超伝導,強相関f電子系など))
• 20pGQ-11 高周波測定対応STMと表面電子スピン検出(20pGQ 表面界面電子物性,領域9(表面・界面,結晶成長))
• 23aGH-3 レーザー角度分解光電子分光によるFe(Se_Te_x)の超伝導電子状態の観測(23aGH Fe(Se,Te),新規物質等(置換効果,分光等),領域8(強相関系:高温超伝導,強相関f電子系など))
• 23pGE-4 RuAsの量子臨界点における超伝導(23pGE 新物質など2,領域8(強相関系:高温超伝導,強相関f電子系など))
• 23aGH-4 FeTe_Se_xの電子、磁気ラマン散乱(23aGH Fe(Se,Te),新規物質等(置換効果,分光等),領域8(強相関系:高温超伝導,強相関f電子系など))
• オゾンを用いたコンニャク畑の土壌消毒法の予備的研究
• 17pRA-7 二枚の平行板陰極を有するグロー放電の電流-電圧特性と発光形態
• Hollow 陰極放電の発光モードの物理的機構に関する研究
• 23pB-10 アルゴンアフタグローおける電磁波の負の吸収の観測(II)
• モンテカルロシミュレーションによるRF放電のα領域とγ領域の放電維持機構の解析
• 24pYF-3 アルゴンアフタグローおける電磁波の負の吸収の観測
• モンテカルロ・シミュレーションによるホロー陰極放電の機構解析
• 25a-F-4 低電子密度における陽光柱理論の実験的検証(II)
• 平板ホローカソードを用いた直流放電の基礎特性
• アフタグロー法を用いたアルゴン電離気体中の電子の実効拡散係数の測定
• 31p-YL-1 低電子密度における陽光柱理論の実験的検証
• アフタグロー法を用いた両極性拡散から自由拡散への移行の研究
• アフタグロー法を用いた拡散の電子密度依存の検証
• アフタグロー法を用いた拡散の電子密度依存の検証(II)
• 2p-A-7 同軸円筒電極プラズマの特性(I)
• 29a-T-10 Ar高周波放電における探針測定
• Plasma Absorption Probe for Measuring Electron Density in an Environment Soiled with Processing Plasmas
• Diagnostic of Surface Wave Plasma for Oxide Etching in Comparison with Inductive RF Plasma
• Superconducting Proximity Effect in Cu Clad Nb Wires Doped with Mn, Fe,Co and Ni
• Superconducting Proximity Effect in Cu-Clad Nb Wires Doped with Fe,Co and Ni
• Superconductivity Unresponsive to Magnetic Substituents in YBa_2(Cu_M_x)_3O_
• 磁気混合流体を用いた平面研磨加工面に及ぼす磁場の影響 ([日本実験力学会]2009年度年次講演会)
• 磁気機能性流体による管内面研磨に対する流体力学的考察
• 磁気機能性流体による細管内面研磨の提案と技術的検討
• Dependences of Giant Magnetoresistance in Co/Cu Multilayers on Sputtering Conditions
• Measurement of Diffusion Coefficient of CF_2 Radical in DC Pulsed CF_4/H_2 Discharge Plasma
• Measurements of Diffusion Coefficient of CF_2 Radical in DC Pulsed CF_4/O_2 Discharge Plasma ( Plasma Processing)
• Electron-Impact Dissociation of Methane into CH_3 and CH_2 Radicals : II. Absolute Cross Sections
• Electron-Impact Dissociation of Methane into CH_3 and CH_2 Radicals : I. Relative Cross Sections
• Dissociative Ion Yields on Metal Surfaces Bombarded with Low-Energy Fluorocarbon Ions
• Observation of Ion Scattering from Metal Surfaces Bombarded with Low-Energy Hydrocarbon Ions
• Generation of a Large Electron Beam for Plasma Processing
• Formation of CH Radical by Surface Bombardment in a Methane/Argon DC Discharge
• 磁気混合流体を用いた細管内面の新しい研磨法について (日本実験力学会2004年度年次講演会) -- (実験力学分野全般(1))
• RF Plasma Production at Ultralow Pressures with Surface Magnetic Confinement
• Analytical Expression Based Design of a Low-Voltage FD-SOI CMOS Low-Noise Amplifier(Analog Circuit Techniques and Related Topics)
• Space- and Time-Resolved Measurements of Negative Ions in a Pulsed Inductively-Coupled Plasma in Chlorine
• A New Technology for Negative Ion Detection and the Rapid Electron Cooling in a Pulsed High-Density Etching Plasma
• Hydrogen-Reduced Carbonization by Acetylene Discharges
• Wall Heating Effect on Crystallization of Low-Temperature Deposited Silicon Films from an Inductuvely-Coupled Plasma
• Lower Temperature Deposition of Polycrystalline Silicon Films from a Modified Inductively Coupled Silane Plasma
• LOW-TEMPERATURE FORMATION OF poly-Si FILMS BY INDUCTIVELY-COUPLED SILANE PLASMA
• Reverse-Mode Single Ion Beam Induced Charge (R-mode SIBIC) Imaging for the Test of Total Dose Effects in n-ch Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET)
• Drastic Change in CF_2 and CF_3 Kinetics Induced by Hydrogen Addition into CF_4 Etching Plasma
• Spatial Distribution and Surface Loss of CF_3 and CF_2 Radicals in a CF_4 Etching Plasma
• Two-Dimensional Distributions of Ti and Ti^+ Densities in High-Pressure Magnetron Sputtering Discharges
• Radial Density Profile of Microwave Plasma for Wall Conditioning in a Purely Toroidal Magnetic Field (小特集 粒子・熱制御とプラズマ対向材料研究の進展--IEA/TEXTOR共同研究の成果と現状)
• High Speed Cleaning of Boronized Wall with a CF_4 Containing Plasma
• Rapid Cleaning of Boronized Walls with a Chlorine/Hydrogen Glow Discharge
• Influence of Excitation Frequency on the Electron Distribution Function in Capacitively Coupled Discharges in Argon and Helium
• A Radio Frequency Driven DC Electron Beam Source
• Dramatic Improvement of Surface Wave Plasma Performance Using a Corrugated Dielectric Plate : Nuclear Science, Plasmas, and Electric Discharges
• Dependence of Fluorocarbon Plasma Chemistry on the Electron Energy Distribution Function
• Mode Conversion and Electron Heating by Oblique Injection of the Ordinary Mode into Over-Dense Plasma
• Electron Heating by Oblique Injection of Ordinary Mode into Overdense Plasma
• Suppression of Oxygen Impurity Incorporation into Silicon Films Prepared from Surface-Wave Excited H_2/SiH_4 Plasma
• Lower-Temperature Growth of Hydrogenated Amorphous Silicon Films from Inductively Coupled Silane Plasma
• Simple Direct Monitoring of SiH_3 Radical and Particulates in a Silane Plasma with Ultraviolet Transmission Spectroscopy
• Cross Section Measurements for Electron-Impact Dissociation of CHF_3 into Neutral and Ionic Radicals
• Single-Event Upset Test of Static Random Access Memory Using Single-Ion Microprobe
• Environmental regulation of abult diapause of Graphosoma rubrolineatum (Westwood) (Heteroptera : Pentatomidae) in southern and northern populations of Japan
• The Layered Composite Crystal Structure of the Ternary Sulfied, (SnS)_TaS_2 "SnTaS_3"
• Thermal Resistance and Electrornic Characteristics for High Electron Mobility Transistors Grown on Si and GaAs Substrates by Metal-Organic Chemical Vapor Deposition
• Measurements of Diffusion Coefficient of CF_2 Radical in DC Pulsed CF_4 Discharge Plasma
• The Layered Composite Crystal Structure of the Ternary Sulfide, (BiS)_TaS_2 "BiTaS_3"
• Site Dependence of Soft Errors Induced by Single-Ion Hitting in 64 kbit Static Random Access Memory (SRAM)
• Cross Sections for Electron-Impact Dissociation of Alternative Etching Gas, C_3HF_7O
• Test-Wave Measurements of Microwave Absorption Efficiency in a Planar Surface-Wave Plasma Reactor
• Production of Low-Pressure Planar Non-Magnetized Plasmas Sustained under a Dielectric-Free Metal-Plasma Interface
• Production and Control of Low-Pressure Ar and CF_4 Plasmas Using Surface Waves
• Cross Section Measurements for Electron-Impact Dissociation of C_4F_8 into Neutral and Ionic Radicals
• High-Speed Etching of Indium-Tin-Oxide Thin Films Using an Inductively Coupled Plasma ( Plasma Processing)
• Effects of photoperiod and temperature on the induction of adult diapause in Dolycoris baccarum (L.) (Heteroptera: Pentatomidae) from Osaka and Hokkaido, Japan
• Deposition of Tungsten Carbide Thin Films by Simultaneous RF Sputtering
• Ar/O_2 gas pressure dependence of atomic components of zirconia prepared by intermittent zirconium arc PBII&D
• Whistler Wave Trapping in a Narrow Density Trough
• Observation of Transit-Time Electron Heating by Localize RF Field
• Transit-Time RF Heating of Plasma Based on Fermi Acceleration
• Dispersion and Attenuation of Whistler Waves in a Finite Plasma
• A New Approach to Boronization of Fusion Devices
• Two-Dimensional Modeling of Slot-Excited Surface Waves in Bounded Planar Plasmas
• Radical Control by Wall Heating of a Fluorocarbon Etching Reactor
• Absolute Fluorine Atom Densities in Fluorocarbon High-Density Plasmas Measured by Appearance Mass Spectrometry
• Mechanism of Oxidation of Si Surfaces Exposed to O_2/Ar Microwave-Excited Plasma
• Negative Ion Transfer Model of Low-Temperature Oxidation of Silicon Surface by High-Density Microwave Plasma
• Optical Emission and Microwave Field Intensity Measurements in Surface Wave-Excited Planar Plasma
• Pressure Dependence of Carbon Film Coating by a Toroidal Methane Discharge
• Reduction of Plasma Damage in Reactive Ion Etching by Means of Suppressing Self-Bias ( Plasma Processing)
• Monte Carlo Simulation of Normal and Abnormal Glow Discharge Plasmas Using the Limited Weight Probability Method
• Unique Point on Langmuir Probe Characteristics under Influence of Potential Fluctuations
• Monte Carlo Simulation of RF Plasmas and Trial Investigation of Similarity Rule
• 2重構造タ-ゲットによるAlスパッタ膜のステップカバレッジ(速報) (第25回真空に関する連合講演会プロシ-ディングス--昭和59年10月29日〜31日)
• Particle Simulation Study of Transition of Spatial Structure in a Plane-Parallel Hollow Cathode Discharge
• Monte Carlo Simulation of Discharge Plasmas Using Fine Subslabs

もっと見る 閉じる

スポンサーリンク