Mechanism of Oxidation of Si Surfaces Exposed to O_2/Ar Microwave-Excited Plasma
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2007-01-15
著者
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Sugai Hideo
Department of Electrical Engineering, Nagoya University
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YAMAUCHI Takeshi
Corporate Manufacturing Engineering Center, TOSHIBA Corporation
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HASEGAWA Isahiro
Procurement Division, Semiconductor Company, Toshiba Corporation
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