Suppression of Oxygen Impurity Incorporation into Silicon Films Prepared from Surface-Wave Excited H_2/SiH_4 Plasma
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-11-15
著者
-
Sugai Hideo
Department of Electrical Engineering, Nagoya University
-
Toyoda H
Department Of Electrical Engineering School Of Engineering Nagoya Univeristy
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Toyoda Hirotaka
Department Of Electrical Engineering Nagoya University
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菅井 秀郎
中部大学工学部電気システム工学科
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SOMIYA Satoru
Department of Electrical Engineering and Computer Science, School of Engineering, Nagoya University
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HOTTA Yoshihiko
Department of Electrical Engineering and Computer Science, School of Engineering, Nagoya University
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