Negative Ion Transfer Model of Low-Temperature Oxidation of Silicon Surface by High-Density Microwave Plasma
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概要
- 論文の詳細を見る
- Japan Society of Applied Physicsの論文
- 2006-10-25
著者
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Sugai Hideo
Department of Electrical Engineering, Nagoya University
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Sugai Hideo
Department Of Electrical Engineering Nagoya University
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YAMAUCHI Takeshi
Corporate Manufacturing Engineering Center, TOSHIBA Corporation
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Yamauchi Takeshi
Corporate Manufacturing Engineering Center Toshiba Corporation
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HASEGAWA Isahiro
Procurement Division, Semiconductor Company, Toshiba Corporation
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Hasegawa Isahiro
Procurement Division Semiconductor Company Toshiba Corporation
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Sugai Hideo
Department O Electrical Engineering Nagoya University
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