Hot Spots and Electron Heating Processes in a Helicon-Wave Excited Plasma

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概要

• 論文の詳細を見る

• Two-dimensional cross-field measurements of ArII optical emission induced by hot electrons (>19.2 eV) are made to investigate the mechanism of rf power deposition in a helicon-wave excited plasma. Hot spots of the optical emission are observed near the walls underneath the antenna conductor carrying the axial rf current. This suggests the significant electron heating by the axial electric field of antenna near-fields. Time-resolved emission measurements reveal the heating time of 〜 1 μs for the hot spots and 〜 10 μs for the bulk plasma where the wave fields dominate the near-fields.

• 社団法人応用物理学会の論文
• 1995-04-30

著者

• SUZUKI Keiji

  Department of Molecular Medicine, Nagasaki University Graduate School of Biomedical Sciences

• Suzuki K

  School Of Science And Engineering Waseda University:kagami Memorial Laboratory For Materials Science

• Nakamura Keiji

  Department Of Electrical Electronics And Information Engineering Graduate School Of Engineering Osak

• Suzuki K

  Ntt Transmission Systems Laboratories Lightwave Communications Laboratory

• Nakamura K

  Department Of Electrical Engineering School Of Engineering Nagoya University

• Suzuki K

  Assoc. Super‐advanced Electronics Technol. Kanagawa Jpn

• Suzuki K

  Department Of Information And Communication Technology Tokai University

• Sugai Hideo

  Department O Electrical Engineering Nagoya University

• Nakamura Keiji

  Department Of Biology And Geosciences Graduate School Of Science Osaka City University:present Addre

• Suzuki Keiji

  Department Of Electrical Engineering Nagoya University

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