High Tilt Angle Ion Implantation into Polycrystalline Si Gates

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2005-02-15

著者

• KATAOKA Yuji

  Fujitsu Laboratories Ltd.

• Suzuki K

  School Of Science And Engineering Waseda University:kagami Memorial Laboratory For Materials Science

• Kataoka Y

  Toshiba Corp. Yokohama Jpn

• SUZUKI Kunihiro

  Fujitsu Laboratories Ltd.

• Suzuki Kenshu

  Division Of Public Health Department Of Social Medicine Nihon University School Of Medicine

• Aoyama T

  Hitachi Ltd. Ibaraki Jpn

• AOYAMA Takayuki

  Fujitsu Laboratories Lid.

• Suzuki K

  Department Of Information And Communication Technology Tokai University

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