Diagnostic of Surface Wave Plasma for Oxide Etching in Comparison with Inductive RF Plasma
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-09-15
著者
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Kokura Hikaru
Department of Electrical Engineering, Nagoya University
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Nakamura Keiji
Department of Electrical Engineering, Nagoya University
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Sugai Hideo
Department of Electrical Engineering, Nagoya University
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Yoneda Shinichi
Department of Electrical Engineering, Nagoya University
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Mitsuhira Noriyuki
Sumitomo Metal Industries Co., Ltd.
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Nakamura Moritaka
Fujitsu Co., Ltd.
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中村 僖良
東北大学大学院工学研究科
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Sugai Hideo
Department Of Electrical Engineering School Of Engineering Nagoya Univeristy
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菅井 秀郎
名古屋大
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Sugai Hideo
Department Of Electrical Engineering Faculty Of Engineering Nagoya University
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Nakamura Keiji
Department Of Electrical Electronics And Information Engineering Graduate School Of Engineering Osak
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Nakamura K
Department Of Electrical Engineering School Of Engineering Nagoya University
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Nakamura K
Tokyo Electron Ltd. Tokyo Jpn
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菅井 秀郎
中部大学工学部電気システム工学科
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Yoneda Shinichi
Department Of Electrical Engineering Nagoya University
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Nakamura Moritaka
Fujitsu Co. Ltd.
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Mitsuhira Noriyuki
Sumitomo Metal Industries Co. Ltd.
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菅井 秀郎
中部大学
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Kokura H
Nagoya Univ. Nagoya Jpn
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Kokura Hikaru
Department Of Electrical Engineering Nagoya University
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Sugai Hideo
Department O Electrical Engineering Nagoya University
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Nakamura Keiji
Department Of Biology And Geosciences Graduate School Of Science Osaka City University:present Addre
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