Drastic Change in CF_2 and CF_3 Kinetics Induced by Hydrogen Addition into CF_4 Etching Plasma
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-05-01
著者
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Sugai Hideo
Department of Electrical Engineering, Nagoya University
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Toyoda Haruhisa
Department Of Material Physics Faculty Of Engineering Science Osaka University
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Toyoda H
Department Of Electrical Engineering School Of Engineering Nagoya Univeristy
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Toyoda H
Nagoya Univ. Nagoya Jpn
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Toyoda Hirotaka
Department Of Electrical Engineering Nagoya University
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Sugai Hideo
Department Of Electrical Engineering Faculty Of Engineering Nagoya University
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HIKOSAKA Yukinobu
Department of Electrical Engineering, Nagoya University
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Toyoda Hirotaka
Department Of Electrical Engineering And Computer Science Nagoya University
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Hikosaka Y
Association Of Super-advanced Electronics Technologies (aset):(present Address)device Development Di
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Hikosaka Yukinobu
Department O Electrical Engineering Nagoya University:basic Process Development Division Fujitsu Ltd
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Sugai Hideo
Department O Electrical Engineering Nagoya University
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