Formation of CH Radical by Surface Bombardment in a Methane/Argon DC Discharge
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1989-09-20
著者
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Sugai Hideo
Department of Electrical Engineering, Nagoya University
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Toyoda Hirotaka
Department Of Electrical Engineering Nagoya University
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YAMASHITA Yuhji
Department of Electrical Engineering, Nagoya University
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Yamashita Yuhji
Department Of Electrical Engineering Nagoya University
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Toyoda Hirotaka
Department Of Electrical Engineering And Computer Science Nagoya University
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Sugai Hideo
Department O Electrical Engineering Nagoya University
関連論文
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- Dependences of Giant Magnetoresistance in Co/Cu Multilayers on Sputtering Conditions
- Electron-Impact Dissociation of Methane into CH_3 and CH_2 Radicals : II. Absolute Cross Sections
- Electron-Impact Dissociation of Methane into CH_3 and CH_2 Radicals : I. Relative Cross Sections
- Dissociative Ion Yields on Metal Surfaces Bombarded with Low-Energy Fluorocarbon Ions
- Observation of Ion Scattering from Metal Surfaces Bombarded with Low-Energy Hydrocarbon Ions
- Generation of a Large Electron Beam for Plasma Processing
- Formation of CH Radical by Surface Bombardment in a Methane/Argon DC Discharge
- RF Plasma Production at Ultralow Pressures with Surface Magnetic Confinement
- Space- and Time-Resolved Measurements of Negative Ions in a Pulsed Inductively-Coupled Plasma in Chlorine
- A New Technology for Negative Ion Detection and the Rapid Electron Cooling in a Pulsed High-Density Etching Plasma
- Hydrogen-Reduced Carbonization by Acetylene Discharges
- Wall Heating Effect on Crystallization of Low-Temperature Deposited Silicon Films from an Inductuvely-Coupled Plasma
- Lower Temperature Deposition of Polycrystalline Silicon Films from a Modified Inductively Coupled Silane Plasma
- LOW-TEMPERATURE FORMATION OF poly-Si FILMS BY INDUCTIVELY-COUPLED SILANE PLASMA
- Drastic Change in CF_2 and CF_3 Kinetics Induced by Hydrogen Addition into CF_4 Etching Plasma
- Spatial Distribution and Surface Loss of CF_3 and CF_2 Radicals in a CF_4 Etching Plasma
- Radial Density Profile of Microwave Plasma for Wall Conditioning in a Purely Toroidal Magnetic Field (小特集 粒子・熱制御とプラズマ対向材料研究の進展--IEA/TEXTOR共同研究の成果と現状)
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- Influence of Excitation Frequency on the Electron Distribution Function in Capacitively Coupled Discharges in Argon and Helium
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- Whistler Wave Trapping in a Narrow Density Trough
- Observation of Transit-Time Electron Heating by Localize RF Field
- Transit-Time RF Heating of Plasma Based on Fermi Acceleration
- Dispersion and Attenuation of Whistler Waves in a Finite Plasma
- A New Approach to Boronization of Fusion Devices
- Two-Dimensional Modeling of Slot-Excited Surface Waves in Bounded Planar Plasmas
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- Mechanism of Oxidation of Si Surfaces Exposed to O_2/Ar Microwave-Excited Plasma
- Negative Ion Transfer Model of Low-Temperature Oxidation of Silicon Surface by High-Density Microwave Plasma
- Optical Emission and Microwave Field Intensity Measurements in Surface Wave-Excited Planar Plasma
- Pressure Dependence of Carbon Film Coating by a Toroidal Methane Discharge
- Spatial Profile Measurement of SiH3 Radical Flux in SiH4/H2 Microwave Plasma by Modified Appearance Mass Spectrometry
- Free Radicals in an Inductively Coupled Etching Plasma
- Excitation of Azimuthally Propagating Ion-Cyclotron Drift Waves in Large Magnetized Plasma : Nuclear Science, Plasmas and Electric Discharges
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- Plasma Oscillation Method for Measurements of Absolute Electron Density in Plasma
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- Resonant Directional Excitation of Helicon Waves by a Helical Antenna
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- Low-Frequency Electrostatic Waves in a Weakly Ionized Plasma under a Weak Magnetic Field
- Radical Kinetics in a Fluorocarbon Etching Plasma
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- Partial Cross Sections for Electron Impact Dissociation of CF_4 into Neutral Radicals
- INFLUENCE OF ION-INDUCED RADICAL DESORPTION FROM FLUOROCARBON DEPOSITS IN A HIGH DENSITY PLASMAS
- Surface Wave Eigenmodes in a Finite-Area Plane Microwave Plasma
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- Modeling Microwave Resonance of Curling Probe for Density Measurements in Reactive Plasmas
- Characteristics of Ultrahigh-Frequency Surface-Wave Plasmas Excited at 915 MHz
- Novel Antenna Coupler Design for Production of Meter-Scale High-Density Planar Surface Wave Plasma
- Low Temperature Growth of Amorphous and Polycrystalline Silicon Films from a Modified Inductively Coupled Plasma
- New Inductive rf Discharge Using an Internal Metal Antenna
- Electrostatic Coupling of Antenna and the Shielding Effect in Inductive RF Plasmas
- Effect of Sputtering Deposition Process on Magnetic Properties of Magnetic Multilayers
- Nitriding of Polymer by Low Energy Nitrogen Neutral Beam Source
- Suppression of Oxygen Impurity Incorporation into Silicon Films Prepared from Surface-Wave Excited H2/SiH4 Plasma
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- Cross Section Measurements for Electron-Impact Dissociation of C 4F 8 into Neutral and Ionic Radicals
- Opto-Curling Probe for Simultaneous Monitoring of Optical Emission and Electron Density in Reactive Plasmas
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- Influence of Oxygen Addition and Wafer Bias Voltage on Bromine Atom Surface Reaction in a HBr/Ar Inductively Coupled Plasma
- Plasma Effects on Electrostatic Chuck Characteristics on Capacitive RF Discharge
- Influence of Oxygen Addition and Wafer Bias Voltage on Bromine Atom Surface Reaction in a HBr/Ar Inductively Coupled Plasma (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)
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