Absolute Fluorine Atom Densities in Fluorocarbon High-Density Plasmas Measured by Appearance Mass Spectrometry
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概要
- 論文の詳細を見る
We report absolute flvtorine atom (F) derasity measurements based on appearance mass spectrometry (AMS). A liquid nitrogera cold trap installed in a mass spectrometer dramatically reduces background noise at m/e = 19(F^+), enabling reliable AMS measurement of F density. The F density reaches 〜1O^19 m^-3 in high-density inductively coupled plasmas in 100 % CF_4 or C_4F_8 while addition of 50 % hydrogen decretrses the F density by one order of magnitude. A conventional actinometry techniqtue results in a factor of 〜 4 greater reduction of F density in comparison with the AMS result. High etch selectivity of Si0_2 to Si is achieved for the radical density ratio CF_xF larger than 25 (x=1-3).
- 社団法人応用物理学会の論文
- 1997-04-01
著者
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Nakamura Keiji
Department of Electrical Engineering, Nagoya University
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Sugai Hideo
Department of Electrical Engineering, Nagoya University
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Nakamura Keiji
Department Of Electrical Engineering School Of Engineering Nagoya University
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SEGI Kazunori
Department of Electrical Engineering, School of Engineering, Nagoya University
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Sugai Hideo
Department O Electrical Engineering Nagoya University
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Segi K
Department Of Electrical Engineering School Of Engineering Nagoya University
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Nakamura Keiji
Department Of Biology And Geosciences Graduate School Of Science Osaka City University:present Addre
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