Electrostatic Coupling of Antenna and the Shielding Effect in Inductive RF Plasmas
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概要
- 論文の詳細を見る
Capacitive coupling from a current-flowing antenna to inductive rf plasma plays an important role not only in the discharge mechanism but also in the impurity release from materials around the antenna. As a result of this coupling, there appears a large negative do voltage (V_<DC>) on the surface of material which insulates the antenna conductor from the plasma. The magnitude of V_<DC> is directly measured as a function of rf power, thickness of the insulating material, and the position along the antenna. A simple model to describe the electrostatic antenna-plasma coupling is proposed. In addition, the effect of Faraday shields on the inductively coupled rf discharge is presented.
- 社団法人応用物理学会の論文
- 1994-04-30
著者
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Nakamura Kenji
Department Of Anatomy Graduate School Of Medicine Osaka City University
-
Sugai Hideo
Department O Electrical Engineering Nagoya University
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Nakamura Kenji
Department Of Electrical Engineering Nagoya University
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Suzuki Keiji
Department Of Electrical Engineering Nagoya University
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