Space- and Time-Resolved Measurements of Negative Ions in a Pulsed Inductively-Coupled Plasma in Chlorine
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概要
- 論文の詳細を見る
Chlorine negative ion densities in a pulsed-power high-density etching reactor are measured in an absolute value with the plasma oscillation method assisted by the laser-induced photodetachment. In measuring negative ions in a high-density plasma, a conventional photodetachment method using a positively-biased probe shows several problems. While the probe method is available only for relative measurements, a plasma oscillation method for measuring the absolute negative ion density is developed, which is based on electron-beam excited instabilities at plasma frequency. Using these methods, a temporal change in the negative ion density is successfully measured in a pulsed plasma with a time resolution of-1us. In addition, a self-aligned photodetachment probe is developed for space-resolved diagnostics, which enabled the first measurement of Cl^-density distributions in the source and downstream regions.
- 社団法人プラズマ・核融合学会の論文
- 1997-01-25
著者
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Nakamura Keiji
Department of Electrical Engineering, Nagoya University
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Sugai Hideo
Department of Electrical Engineering, Nagoya University
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Ahn Tae
On Leave From Semiconductor R&d Center Samsung Electronics Co. Ltd.
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Sugai Hideo
Department Of Electrical Engineering School Of Engineering Nagoya Univeristy
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Nakamura Keiji
Department Of Electrical Electronics And Information Engineering Graduate School Of Engineering Osak
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Nakamura K
Department Of Electrical Engineering School Of Engineering Nagoya University
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Nakamura Keiji
Department Of Electrical Engineering Nagoya University
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Sugai Hideo
Department O Electrical Engineering Nagoya University
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Nakamura Keiji
Department Of Biology And Geosciences Graduate School Of Science Osaka City University:present Addre
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安 太赫
on leave from semiconductor R&D Center, Samsung Electronics Co., Ltd.
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中村 圭二
Department of Electrical Engineering, Nagoya University
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菅井 秀郎
Department of Electrical Engineering, Nagoya University
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