Cross Section Measurements for Electron-Impact Dissociation of C 4F 8 into Neutral and Ionic Radicals
スポンサーリンク
概要
- 論文の詳細を見る
The absolute cross sections for electron-impact dissociation of octafluoro-cyclobutane (C4F8) into the neutral radicals CF, CF2, CF3 and C3F5 are measured from the threshold to 250 eV. This measurement was accomplished by appearance mass spectrometry in a dual electron beam device. The threshold energies for the neutral dissociation into CF, CF2 and CF3 are 14.5, 10.5 and 12.8 eV, respectively. The cross sections for dissociation from C4F8 into CF2 and CF are much larger than those from CF4. Besides the neutral dissociation, the cross sections for the dissociative ionization of C4F8 are extensively measured for formation of CF+, CF2+, CF3+, C2F3+, C2F4+ and C3F5+.
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 1997-06-15
著者
-
Toyoda Hirotaka
Department Of Electrical Engineering And Computer Science Nagoya University
-
Sugai Hideo
Department O Electrical Engineering Nagoya University
-
Iio Makoto
Department Of Electrical Engineering School Of Engineering Nagoya University
-
Toyoda Hirotaka
Department of Electrical Engineering, School of Engineering, Nagoya University,
-
Iio Makoto
Department of Electrical Engineering, School of Engineering, Nagoya University,
関連論文
- Dechuck Operation of Coulomb Type and Johnsen-Rahbek Type of Electrostatic Chuck Used in Plasma Processing
- Plasma Absorption Probe for Measuring Electron Density in an Environment Soiled with Processing Plasmas
- Diagnostic of Surface Wave Plasma for Oxide Etching in Comparison with Inductive RF Plasma
- Dependences of Giant Magnetoresistance in Co/Cu Multilayers on Sputtering Conditions
- Electron-Impact Dissociation of Methane into CH_3 and CH_2 Radicals : II. Absolute Cross Sections
- Electron-Impact Dissociation of Methane into CH_3 and CH_2 Radicals : I. Relative Cross Sections
- Dissociative Ion Yields on Metal Surfaces Bombarded with Low-Energy Fluorocarbon Ions
- Observation of Ion Scattering from Metal Surfaces Bombarded with Low-Energy Hydrocarbon Ions
- Generation of a Large Electron Beam for Plasma Processing
- Formation of CH Radical by Surface Bombardment in a Methane/Argon DC Discharge
- RF Plasma Production at Ultralow Pressures with Surface Magnetic Confinement
- Space- and Time-Resolved Measurements of Negative Ions in a Pulsed Inductively-Coupled Plasma in Chlorine
- A New Technology for Negative Ion Detection and the Rapid Electron Cooling in a Pulsed High-Density Etching Plasma
- Hydrogen-Reduced Carbonization by Acetylene Discharges
- Wall Heating Effect on Crystallization of Low-Temperature Deposited Silicon Films from an Inductuvely-Coupled Plasma
- Lower Temperature Deposition of Polycrystalline Silicon Films from a Modified Inductively Coupled Silane Plasma
- LOW-TEMPERATURE FORMATION OF poly-Si FILMS BY INDUCTIVELY-COUPLED SILANE PLASMA
- Drastic Change in CF_2 and CF_3 Kinetics Induced by Hydrogen Addition into CF_4 Etching Plasma
- Spatial Distribution and Surface Loss of CF_3 and CF_2 Radicals in a CF_4 Etching Plasma
- Radial Density Profile of Microwave Plasma for Wall Conditioning in a Purely Toroidal Magnetic Field (小特集 粒子・熱制御とプラズマ対向材料研究の進展--IEA/TEXTOR共同研究の成果と現状)
- High Speed Cleaning of Boronized Wall with a CF_4 Containing Plasma
- Rapid Cleaning of Boronized Walls with a Chlorine/Hydrogen Glow Discharge
- A Radio Frequency Driven DC Electron Beam Source
- Dramatic Improvement of Surface Wave Plasma Performance Using a Corrugated Dielectric Plate : Nuclear Science, Plasmas, and Electric Discharges
- Dependence of Fluorocarbon Plasma Chemistry on the Electron Energy Distribution Function
- Mode Conversion and Electron Heating by Oblique Injection of the Ordinary Mode into Over-Dense Plasma
- Electron Heating by Oblique Injection of Ordinary Mode into Overdense Plasma
- Lower-Temperature Growth of Hydrogenated Amorphous Silicon Films from Inductively Coupled Silane Plasma
- Simple Direct Monitoring of SiH_3 Radical and Particulates in a Silane Plasma with Ultraviolet Transmission Spectroscopy
- Cross Section Measurements for Electron-Impact Dissociation of CHF_3 into Neutral and Ionic Radicals
- Cross Sections for Electron-Impact Dissociation of Alternative Etching Gas, C_3HF_7O
- Test-Wave Measurements of Microwave Absorption Efficiency in a Planar Surface-Wave Plasma Reactor
- Production of Low-Pressure Planar Non-Magnetized Plasmas Sustained under a Dielectric-Free Metal-Plasma Interface
- Production and Control of Low-Pressure Ar and CF_4 Plasmas Using Surface Waves
- Cross Section Measurements for Electron-Impact Dissociation of C_4F_8 into Neutral and Ionic Radicals
- High-Speed Etching of Indium-Tin-Oxide Thin Films Using an Inductively Coupled Plasma ( Plasma Processing)
- Design of Large-Area Surface Wave Plasma Excited by Slotted Waveguide Antennas with Novel Power Divider
- Effect of O- Ion Beam Irradiation during RF-Magnetron Sputtering on Characteristics of CoFeB--MgO Magnetic Tunnel Junctions
- Whistler Wave Trapping in a Narrow Density Trough
- Observation of Transit-Time Electron Heating by Localize RF Field
- Transit-Time RF Heating of Plasma Based on Fermi Acceleration
- Dispersion and Attenuation of Whistler Waves in a Finite Plasma
- A New Approach to Boronization of Fusion Devices
- Two-Dimensional Modeling of Slot-Excited Surface Waves in Bounded Planar Plasmas
- Radical Control by Wall Heating of a Fluorocarbon Etching Reactor
- Absolute Fluorine Atom Densities in Fluorocarbon High-Density Plasmas Measured by Appearance Mass Spectrometry
- Negative Ion Transfer Model of Low-Temperature Oxidation of Silicon Surface by High-Density Microwave Plasma
- Optical Emission and Microwave Field Intensity Measurements in Surface Wave-Excited Planar Plasma
- Pressure Dependence of Carbon Film Coating by a Toroidal Methane Discharge
- Spatial Profile Measurement of SiH3 Radical Flux in SiH4/H2 Microwave Plasma by Modified Appearance Mass Spectrometry
- Free Radicals in an Inductively Coupled Etching Plasma
- Excitation of Azimuthally Propagating Ion-Cyclotron Drift Waves in Large Magnetized Plasma : Nuclear Science, Plasmas and Electric Discharges
- Ion Cyclotron Drift Waves in Plasmas with Controlled Radial Density Distributions
- Plasma Oscillation Method for Measurements of Absolute Electron Density in Plasma
- Mechanism of Cross-Field Heating of Ions
- Wall Temperature Dependence of Boronization Using Decaborane and Diborane
- Resonant Directional Excitation of Helicon Waves by a Helical Antenna
- Hot Spots and Electron Heating Processes in a Helicon-Wave Excited Plasma
- Low-Frequency Electrostatic Waves in a Weakly Ionized Plasma under a Weak Magnetic Field
- Radical Kinetics in a Fluorocarbon Etching Plasma
- RECENT DEVELOPMENT OF HIGH-DENSITY PLASMA SOURCES FOR SEMICONDUCTOR PROCESSING
- Partial Cross Sections for Electron Impact Dissociation of CF_4 into Neutral Radicals
- INFLUENCE OF ION-INDUCED RADICAL DESORPTION FROM FLUOROCARBON DEPOSITS IN A HIGH DENSITY PLASMAS
- Surface Wave Eigenmodes in a Finite-Area Plane Microwave Plasma
- External Excitation of Space Charge Waves in RF Discharges
- Modeling Microwave Resonance of Curling Probe for Density Measurements in Reactive Plasmas
- Characteristics of Ultrahigh-Frequency Surface-Wave Plasmas Excited at 915 MHz
- Novel Antenna Coupler Design for Production of Meter-Scale High-Density Planar Surface Wave Plasma
- Low Temperature Growth of Amorphous and Polycrystalline Silicon Films from a Modified Inductively Coupled Plasma
- New Inductive rf Discharge Using an Internal Metal Antenna
- Electrostatic Coupling of Antenna and the Shielding Effect in Inductive RF Plasmas
- Effect of Sputtering Deposition Process on Magnetic Properties of Magnetic Multilayers
- Nitriding of Polymer by Low Energy Nitrogen Neutral Beam Source
- Suppression of Oxygen Impurity Incorporation into Silicon Films Prepared from Surface-Wave Excited H2/SiH4 Plasma
- Suppression of High-Energy Backscattered Particles in Magnetron Plasma Using Cylindrical Cathode
- Dependences of Giant Magnetoresistance in Co/Cu Multilayers on Sputtering Conditions
- Electron Density Range Measurable by Microwave Resonator Probe with Higher Mode Resonance
- Cross Section Measurements for Electron-Impact Dissociation of C 4F 8 into Neutral and Ionic Radicals
- Opto-Curling Probe for Simultaneous Monitoring of Optical Emission and Electron Density in Reactive Plasmas
- Mode Jumps and Hysteresis in Surface-Wave Sustained Microwave Discharges
- Mechanism of Oxidation of Si Surfaces Exposed to O2/Ar Microwave-Excited Plasma
- Multi-Hollow Plasma Production along Dielectric Plate in Microwave Discharge
- Influence of Oxygen Addition and Wafer Bias Voltage on Bromine Atom Surface Reaction in a HBr/Ar Inductively Coupled Plasma
- Plasma Effects on Electrostatic Chuck Characteristics on Capacitive RF Discharge
- Influence of Oxygen Addition and Wafer Bias Voltage on Bromine Atom Surface Reaction in a HBr/Ar Inductively Coupled Plasma (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)
- Influence of Excitation Frequency on the Electron Distribution Function in Capacitively Coupled Discharges in Argon and Helium
- Temporal Analysis of Electrostatic Chuck Characteristics in Inductively Coupled Plasma
- Negative Ion Transfer Model of Low-Temperature Oxidation of Silicon Surface by High-Density Microwave Plasma
- Hydrogen Release and Retention Dynamics of Amorphous Carbon Layers Exposed to a Hydrogen/Helium Plasma